ST0464 Praseodymium Cerium Manganate Sputtering Target

Chemical Formula: Pr(1-x)CexMnO3
Catalog Number: ST0464
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Praseodymium Cerium Manganate sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

Praseodymium Cerium Manganate Sputtering Target Description

Praseodymium Cerium Manganate Sputtering Target is made from praseodymium, cerium, manganese, and oxygen. These high-purity targets are essential in deposition processes to achieve high-quality films. TFM specializes in producing sputtering targets with up to 99.9995% purity, ensuring reliable and consistent product performance through rigorous quality assurance processes.

Related products: Praseodymium Sputtering TargetCerium Sputtering TargetManganese Sputtering Target

Praseodymium

CeriummanganeseOxygen

Praseodymium Cerium Manganate Sputtering Target Specification

Material TypePraseodymium Cerium Manganate
SymbolPr(1-x)CexMnO3
Color/AppearanceSolid
Melting Point/
Density/
Type of BondElastomer, Indium
Available SizesDia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets; please Contact Us for more information.

Praseodymium Cerium Manganate Sputtering Target Application

Praseodymium Cerium Manganate Sputtering Target is utilized for thin film deposition, decoration, semiconductor applications, displays, LEDs, and photovoltaic devices. Additionally, it is used for functional coatings and various optical information storage industries, including glass coatings for automotive and architectural applications, as well as in optical communication.

Praseodymium Cerium Manganate Sputtering Target Bonding Services

Specialized bonding services for Praseodymium Cerium Manganate Sputtering Targets, including indium and elastomeric bonding techniques, enhance performance and durability. Thin Film Materials (TFM) ensures high-quality solutions that meet industry standards and customer needs.

We also offer custom machining of backing plates, which is essential for sputtering target assembly. This comprehensive approach improves target design flexibility and performance in thin film deposition. Our channels provide detailed information about bonding materials, methods, and services, helping clients make informed decisions.

Praseodymium Cerium Manganate Sputtering Target Packaging

Our Praseodymium Cerium Manganate Sputter Targets are meticulously handled to prevent any damage during storage and transportation, ensuring the preservation of the products’ original quality.

Get Contact

TFM offers Praseodymium Cerium Manganate Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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