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ST0109 Scandium Aluminum Sputtering Target, Sc/Al

Chemical Formula: Sc/Al
Catalog Number: ST0109
CAS Number: 7440-20-2 | 7429
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Scandium Aluminum sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

MSDS File

Scandium Aluminum Sputtering Target Description

The Scandium Aluminum Sputtering Target from TFM is an alloy material composed of scandium (Sc) and aluminum (Al). This high-quality sputtering material is designed for applications that benefit from the combined properties of these two elements.

ScandiumScandium, symbolized as “Sc,” is a chemical element named after Scandinavia (with the Latin name Scandia). It was first mentioned and observed by F. Nilson in 1879, who also accomplished its isolation. Scandium has an atomic number of 21 and is located in Period 4, Group 3 of the d-block in the periodic table. Its relative atomic mass is 44.955912(6) Daltons, with the number in brackets indicating the measurement uncertainty.

Related Product: Scandium (Sc) Sputtering Target

AluminumAluminum, also known as aluminium, is a chemical element that originated from the Latin name for alum, ‘alumen,’ meaning bitter salt. It was first mentioned and observed by H.C. Ørsted in 1825, who also accomplished its isolation. Represented by the symbol “Al,” aluminum has an atomic number of 13 and is located in Period 3, Group 13 of the p-block in the periodic table. Its relative atomic mass is 26.9815386(8) Daltons, with the number in brackets indicating the measurement uncertainty.

Related Product: Aluminum Sputtering Target

Scandium Aluminum Sputtering Target Packing

Our Scandium Aluminum Sputter Targets are meticulously tagged and labeled externally to ensure efficient identification and stringent quality control. We take great care to prevent any damage during storage and transportation, ensuring that our products arrive in perfect condition.

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TFM offers Scandium Aluminum Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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