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Sodium Fluoride Evaporation Materials

VD0789 Sodium Fluoride Evaporation Materials, NaF

Catalog No.VD0789
MaterialSodium Fluoride (NaF)
Purity99.9%
ShapePowder/ Granule/ Custom-made

TFM is a top manufacturer and supplier specializing in high-purity sodium fluoride evaporation materials, along with a diverse range of other evaporation materials. We provide these materials in both powder and granule forms, with the option for customized formats tailored to specific needs upon request.

MSDS File

Sodium Fluoride Evaporation Materials

Introduction

Sodium Fluoride (NaF) Evaporation Materials are high-purity fluoride compounds widely used in thin film deposition for optics, electronics, and energy devices. Known for their excellent optical transmission across the ultraviolet (UV), visible, and infrared (IR) spectrum, NaF-based coatings are valuable in optical filters, lenses, and anti-reflective films. Their stability and uniform evaporation behavior make them suitable for both electron beam (e-beam) and thermal evaporation processes.

Detailed Description

Sodium Fluoride evaporation materials are produced from refined high-purity NaF, consolidated into pellets, tablets, or granules to ensure smooth evaporation. With high chemical stability and a low refractive index, NaF thin films provide strong optical performance and durability.

  • Chemical Formula: NaF

  • Purity: 99.9% – 99.99% (3N–4N) to ensure minimal impurities.

  • Appearance: White crystalline solid.

  • Forms: Pellets, tablets, or pieces designed for use in boats, crucibles, or e-beam sources.

  • Properties: High transparency, good adhesion, and consistent evaporation rates under vacuum.

Applications

Sodium Fluoride evaporation materials are used in a wide range of industries:

  • Optical Coatings – Anti-reflective films for lenses, prisms, and windows.

  • Infrared Optics – Coatings for IR transmission devices and sensors.

  • Laser Technology – Thin films for laser optics and protective coatings.

  • Display Technology – Films for enhancing light transmission and minimizing reflection.

  • R&D – Material science studies and experimental coatings with alkali halides.

Technical Parameters

ParameterTypical Value / RangeImportance
Purity99.9% – 99.99%Ensures defect-free, stable optical coatings
Particle/Form SizePellets/Tablets (2–6 mm)Enables uniform evaporation
Evaporation MethodE-beam / ThermalSuitable for multiple deposition systems
AppearanceWhite crystalline solidCharacteristic of NaF

Comparison with Related Materials

MaterialKey AdvantageTypical Application
Sodium Fluoride (NaF)Low refractive index, broad transparencyAR coatings, optics
Lithium Fluoride (LiF)Excellent UV transmissionDeep-UV optics, windows
Calcium Fluoride (CaF₂)High laser damage thresholdLaser and IR optics

FAQ

QuestionAnswer
What forms are available?Pellets, tablets, and granules suitable for thermal or e-beam evaporation.
What is the lead time?Standard delivery is 1–2 weeks depending on order size.
Is NaF hygroscopic?Slightly; it should be stored in a dry, sealed container.
How is it packaged?Vacuum-sealed with desiccants, cushioned with foam, and shipped in export-safe cartons.
Which industries use NaF evaporation materials?Optics, lasers, displays, and advanced R&D.

Packaging

Sodium Fluoride evaporation materials are vacuum-sealed with moisture-proof barriers and desiccants to prevent contamination. Each unit is externally labeled for traceability and packed in export-grade cartons or wooden crates with protective foam inserts.

Conclusion

Sodium Fluoride (NaF) Evaporation Materials provide excellent optical transparency, stable evaporation performance, and reliable coating quality, making them a preferred choice in optical, laser, and display technologies. With customizable purity levels and forms, they are suitable for both industrial-scale deposition and advanced research applications.

For detailed specifications and a quotation, please contact us at [sales@thinfilmmaterials.com].

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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