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Stainless Steel Ball Valves (Pneumatic)

Stainless Steel Ball Valves for High- and Coarse-Vacuum Service

These stainless steel ball valves are specifically designed for high- and coarse-vacuum applications, ensuring optimal performance and reliability.

Key Features

  • Minimal Leak Rate: Maintains a leak rate of less than 1 x 10⁻⁹ standard cc/sec of helium (He).
  • Replaceable Seals: Equipped with PTFE seats and fluorocarbon seals that are easily replaceable without needing to demount the valve.
  • Unrestricted Bore: When open, these valves provide an unrestricted bore, allowing for high gas conductance, making them ideal for low-cost sample entry locks.
  • Effective Closure: When closed, the main bore is evacuated through a side vent hole, ensuring vacuum integrity and efficiency.

Specifications Table

ManufacturerTFM
PressureTorr
Min: 1.000 x 10-8 Torr
Max: 760 Torrmbar
Min: 1.330 x 10-8 mbar
Max: 1013 mbar
RatesHelium Leak Rate
1.010 x 10-9 mbar*L/s
1.000 x 10-9 sccs
7.600 x 10-10 Torr*L/s
TemperatureBakeable
150 ºC
302 ºFIntermittent Bake
200 ºC
392 ºF
Shaft Seal
Material
Shaft with Fluorocarbon (FKM) Seal
Actuator
Type
Pneumatic
Valve Body
Material
316L SS
Valve Seal
Material
Teflon

Ordering Table

Drawing Flange Size Ball Size (inches) Part Number
Tooltip KF16 (1.18" OD) 0.56 BVB0075PVQF-AA
Tooltip KF16 (1.18" OD) 0.56 BVB0075PVQF-AS
Tooltip KF25 (1.57" OD) 0.81 BVC0100PVQF-AA
Tooltip KF25 (1.57" OD) 0.81 BVC0100PVQF-AS
Tooltip KF40 (2.16" OD) 1.25 BVD0150PVQF-AA
Tooltip KF40 (2.16" OD) 1.25 BVD0150PVQF-AS
Tooltip KF50 (2.95" OD) 1.5 BVE0200PVQF-AA
Tooltip KF50 (2.95" OD) 1.5 BVE0200PVQF-AS
Tooltip KF50 (2.95" OD) 1.87 BVF0200PVQF-AA
Tooltip KF50 (2.95" OD) 1.87 BVF0200PVQF-AS

 

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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