Product Overview
Strontium Bismuth Niobate Sputtering Targets (SBN (SrBi2Nb2O9)) (SrBi2Nb2O9) is a composition-specific sputtering target for thin-film deposition and PVD process development. The practical specification normally includes chemistry, purity, dimensions, density, target configuration, and any bonding or backing requirement needed by the sputtering cathode.
Material and Deposition Characteristics
Power mode and process conditions should be selected according to the target conductivity, thermal behavior, and the requirements of the cathode system. For less common materials, conservative initial power density and film-composition verification are good practice.
Technical Data
| Parameter | Typical Value / Range | Importance |
|---|---|---|
| Composition | SrBi₂Nb₂O₉ (SBN) | Determines ferroelectric properties |
| Purity | 99.5% – 99.99% | Ensures film quality and consistency |
| Density | ≥ 95% theoretical | Reduces defects and particle generation |
| Diameter | 50 – 150 mm (custom available) | Compatible with sputtering systems |
| Thickness | 3 – 6 mm | Affects sputtering lifetime |
| Bonding | Indium / Elastomer / Cu backing | Improves thermal stability |
| Crystal Structure | Layered perovskite (Aurivillius) | Enables ferroelectric behavior |
| Material | Key Advantage | Typical Application |
|---|---|---|
| SBN (SrBi₂Nb₂O₉) | Excellent fatigue resistance | FeRAM, ferroelectric devices |
| PZT (Pb(Zr,Ti)O₃) | High polarization | Piezoelectric devices |
| SBT (SrBi₂Ta₂O₉) | Good thermal stability | Non-volatile memory |
| Question | Answer |
|---|---|
| Can SBN sputtering targets be customized? | Yes, size, composition, density, and bonding options can be tailored to your requirements. |
| What sputtering method is recommended? | RF magnetron sputtering is typically used for oxide ceramic targets. |
| Why is SBN used in memory devices? | It offers excellent fatigue resistance and stable ferroelectric properties over many cycles. |
| Are bonded targets necessary? | Yes, bonding improves heat dissipation and reduces cracking risk during sputtering. |
| What are the key challenges in SBN targets? | Controlling bismuth volatility and maintaining stoichiometry during fabrication are critical. |
Typical Thin-Film Applications
- Thin-film research and materials-development projects requiring a composition-specific sputtering source
- Semiconductor, optical, energy, electronic, or laboratory coatings depending on the material system
- Custom R&D work where target composition, purity, and geometry need to be specified together
Target Configuration and Ordering Considerations
For quotation and manufacturability review, provide target size, thickness, purity or alloy composition, quantity, and the sputtering gun or cathode model if known. If a bonded assembly is required, include backing-plate material, bonding preference, and any dimensional tolerances, surface-finish needs, or inspection-document requirements. TFM can also review customer drawings or old-target samples for replacement builds.
Frequently Asked Questions
What is the main reason to use a Strontium Bismuth Niobates (SBN (SrBi2Nb2O9)) sputtering target?
It provides a composition-specific source for thin-film deposition when the target material itself is important to the desired film chemistry or process.
How should the sputtering mode for Strontium Bismuth Niobates (SBN (SrBi2Nb2O9)) be selected?
The power mode should be chosen according to target conductivity, thermal behavior, and equipment capability. Less-conductive materials are commonly evaluated with RF power.
Why are density and microstructure important for Strontium Bismuth Niobates (SBN (SrBi2Nb2O9)) targets?
These factors can influence erosion stability, thermal behavior, particle generation, and the risk of cracking or local hot spots.
Can Strontium Bismuth Niobates (SBN (SrBi2Nb2O9)) be supplied with a backing plate?
Yes. If the material is brittle or the cathode requires it, a bonded configuration can be reviewed according to target size, thickness, cooling, and power.
Does target composition always equal film composition?
No. Film chemistry may differ because of sputtering yields, process conditions, substrate temperature, re-sputtering, and chamber history. Film verification is recommended when composition matters.
What should I provide to request a quotation for Strontium Bismuth Niobates (SBN (SrBi2Nb2O9))?
Please provide the composition, purity, dimensions, quantity, target configuration, cathode details, and any drawing or inspection requirements.
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