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strontium-zirconate

VD0729 Strontium Zirconate Evaporation Materials, SrZrO3

Catalog No.VD0729
MaterialStrontium Zirconate (SrZrO3)
Purity99.9%
ShapePowder/ Granule/ Custom-made

TFM stands out as a top-tier manufacturer and supplier specializing in high-purity strontium zirconate and an extensive range of evaporation materials. Our products come in both powder and granule forms, and we also offer customized options to meet specific needs. Whether you’re looking for standard materials or require tailored solutions, TFM delivers exceptional quality and flexibility.

MSDS File

Strontium Zirconate Evaporation Materials: Product Description

TFM provides high-purity strontium zirconate evaporation materials, chemically represented as SrZrO3. These materials, with purity levels up to 99.9995%, are essential for ensuring high-quality deposition in various industrial processes. Our rigorous quality assurance procedures guarantee that these materials deliver reliable performance.

Strontium Zirconate Evaporation Materials: Applications

Our strontium zirconate evaporation materials are utilized in several key applications, including:

  • Deposition Processes: Perfect for semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optics: Used for wear protection, decorative coatings, and display technologies.

Strontium Zirconate Evaporation Materials: Packaging

We ensure that our strontium zirconate evaporation materials are clearly tagged and labeled for easy identification and quality control. Special care is taken to prevent damage during storage and transportation.

Contact TFM

As a leading supplier of high-purity strontium zirconate and other evaporation materials, TFM offers products in various forms, including tablets, granules, rods, and wires. Customized options and quantities are available upon request. We also provide evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For current prices or to inquire about materials not listed, please reach out to us directly.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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