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strontium-zirconate

VD0729 Strontium Zirconate Evaporation Materials, SrZrO3

Catalog No.VD0729
MaterialStrontium Zirconate (SrZrO3)
Purity99.9%
ShapePowder/ Granule/ Custom-made

TFM stands out as a top-tier manufacturer and supplier specializing in high-purity strontium zirconate and an extensive range of evaporation materials. Our products come in both powder and granule forms, and we also offer customized options to meet specific needs. Whether you’re looking for standard materials or require tailored solutions, TFM delivers exceptional quality and flexibility.

MSDS File

Strontium Zirconate Evaporation Materials

Introduction

The Strontium Zirconate (SrZrO₃) Evaporation Material is a high-performance ceramic source used in thin film deposition by thermal or electron-beam evaporation. With its stable perovskite structure, SrZrO₃ is well-known for its high dielectric constant, thermal stability, and chemical resistance. These properties make it a vital material for advanced coatings in semiconductors, optics, and energy devices.

Detailed Description

Strontium Zirconate evaporation materials are fabricated from high-purity powders (≥99.9%) and consolidated into pieces such as granules, pellets, or tablets. The controlled stoichiometry of SrZrO₃ ensures precise film composition during evaporation, while its high melting point provides thermal stability under vacuum conditions.

Key characteristics include:

  • Stable Perovskite Phase: Maintains crystalline structure during deposition.

  • High Purity: Reduces contamination for high-quality thin films.

  • Thermal Resistance: Suitable for high-temperature evaporation processes.

  • Custom Forms: Available as pieces, pellets, tablets, or custom sizes for specific evaporation sources.

Applications

Strontium Zirconate evaporation materials are widely used in:

  • Semiconductors: High-k dielectric films for gate oxides and capacitors.

  • Optical Coatings: Functional films for optical devices and protective layers.

  • Photovoltaics: Thin films in solar energy conversion devices.

  • Energy Devices: Fuel cells, thermoelectrics, and barrier coatings.

  • R&D: Material science research on perovskite thin films and oxide electronics.

Technical Parameters

ParameterTypical Value / RangeImportance
Purity≥99.9% (3N)Ensures reliable thin film quality
FormPellets, tablets, piecesSuitable for thermal or e-beam evaporation
Melting Point~2,500 °CHigh thermal stability during deposition
Crystal StructurePerovskite (orthorhombic)Stable phase for thin film applications
Density~5.4 g/cm³Influences evaporation behavior

Comparison with Related Materials

MaterialKey AdvantageTypical Application
Strontium ZirconateHigh dielectric stabilityCapacitors, thin films
Strontium Titanate (SrTiO₃)Widely studied, tunable dielectricFerroelectric devices
Zirconium Oxide (ZrO₂)Excellent corrosion resistanceProtective coatings

FAQ

QuestionAnswer
What forms are available for SrZrO₃ evaporation materials?Pellets, tablets, granules, and custom pieces for e-beam or thermal evaporation.
Can the purity be customized?Yes, 3N and 4N purities are available upon request.
How are these materials packaged?Vacuum-sealed in clean containers, cushioned with foam, and shipped in export-safe cartons.
What industries use SrZrO₃ the most?Semiconductor, optics, solar energy, and advanced materials research.

Packaging

All Strontium Zirconate evaporation materials are vacuum-sealed and carefully labeled to ensure purity and traceability. Export-safe cartons and wooden crates provide protection during shipping and long-term storage.

Conclusion

The Strontium Zirconate (SrZrO₃) Evaporation Material is a reliable source for producing high-quality dielectric and protective thin films. With its stable perovskite structure, thermal resistance, and high purity, it is an essential material for cutting-edge semiconductor, optical, and energy applications.

For detailed specifications and a quotation, please contact us at [sales@thinfilmmaterials.com].

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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