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VD0584 Thulium Evaporation Materials, Tm

Catalog No.VD0584
MaterialThulium (Tm)
Purity99.9% ~ 99.99%
ShapePowder/ Granule/ Custom-made

TFM is a leading manufacturer and supplier of high-purity thulium evaporation materials, along with a diverse range of other evaporation materials. We provide these materials in both powder and granule forms, and we also offer custom forms upon request.

Introduction

Thulium (Tm) is a heavy rare-earth element valued for its unique optical and electronic properties. In thin film deposition, Thulium Evaporation Materials are primarily used for physical vapor deposition (PVD) processes such as thermal evaporation and electron beam evaporation. With its narrow emission bands and compatibility with oxide and fluoride systems, thulium plays an important role in advanced photonics, infrared devices, specialty coatings, and research-grade thin films.

For laboratories and industrial coating lines requiring precise rare-earth doping or functional optical layers, high-purity thulium ensures stable evaporation behavior and consistent film composition.

Detailed Description

Thulium Evaporation Materials are supplied in various forms including pieces, granules, pellets, and custom-shaped slugs to match different evaporation sources and crucible geometries. Typical purities range from 99.9% (3N) to 99.99% (4N), with controlled levels of oxygen and other rare-earth impurities.

As a rare-earth metal, thulium exhibits:

  • High melting point (~1545 °C), suitable for e-beam evaporation

  • Stable vapor pressure characteristics under high vacuum

  • Excellent compatibility with oxide formation (e.g., Tm₂O₃ thin films)

  • Narrow-band optical emission around 1.47–2.0 µm when incorporated in host matrices

In evaporation processes, material purity directly affects film transparency, defect density, and optical performance. Controlled granule size improves evaporation uniformity, while compact pellets reduce material spitting during heating. For research-scale deposition, smaller batch quantities are available; for production-scale coating, larger lots with consistent lot traceability can be supplied.

Thulium can also be used as a precursor for reactive deposition to form thulium oxide or doped functional films in oxygen atmospheres.

Applications

Thulium Evaporation Materials are widely used in:

  • Optical coatings for infrared transmission and specialty filters

  • Laser materials research, especially Tm-doped crystals and thin films

  • Infrared detectors and sensors

  • Photonic and waveguide structures

  • Functional oxide thin films (Tm₂O₃)

  • Advanced semiconductor and research coatings

  • Solid-state lighting and luminescent materials development

In research environments, thulium is frequently used for controlled doping of host matrices such as YAG, YLF, and various oxide substrates to tune emission properties.

Technical Parameters

ParameterTypical Value / RangeImportance
Purity99.9% – 99.99%Higher purity improves optical clarity and reduces contamination
FormPieces, Granules, PelletsMatches different evaporation source designs
Size1 – 10 mm (customizable)Influences evaporation stability and loading efficiency
Melting Point~1545 °CDetermines suitable evaporation method
Density~9.32 g/cm³Relevant for weight calculation and deposition rate control
Recommended MethodThermal / E-beam EvaporationEnsures controlled thin film growth

Custom sizes and tailored packaging are available to meet specific deposition system requirements.

Comparison with Related Rare Earth Materials

MaterialKey AdvantageTypical Application
Thulium (Tm)Infrared emission characteristicsIR photonics & doped laser films
Erbium (Er)1.55 µm telecom emissionOptical fiber amplifiers
Ytterbium (Yb)High efficiency laser dopingHigh-power solid-state lasers
Neodymium (Nd)Strong visible/near-IR emissionNd:YAG laser systems

Compared with erbium and ytterbium, thulium is particularly suitable for mid-infrared applications and specialty laser research.

FAQ

QuestionAnswer
Can Thulium Evaporation Materials be customized?Yes, purity, form, size, and batch quantity can be tailored to your deposition system.
Is thulium suitable for thermal evaporation?It can be used in thermal evaporation, but e-beam evaporation is generally preferred due to its melting point.
Can it be used for oxide film deposition?Yes, reactive evaporation in oxygen atmosphere can produce Tm₂O₃ thin films.
How should the material be stored?Store in a dry, inert environment to minimize surface oxidation.
Do you provide traceability documents?Yes, material certificates and batch traceability are available upon request.

Packaging

Our Thulium Evaporation Materials are meticulously tagged and labeled externally to ensure efficient identification and maintain high standards of quality control. We take great care to prevent any potential damage during storage and transportation, ensuring the materials arrive in excellent condition. Packaging options include vacuum-sealed bags with moisture barrier protection and shock-resistant export cartons.

Conclusion

Thulium Evaporation Materials provide a reliable solution for infrared photonics, functional oxide thin films, and rare-earth-doped research applications. With controlled purity, consistent evaporation behavior, and flexible customization options, they are well suited for both laboratory-scale research and industrial thin film production.

For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.

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Tm Disc 2N As Rolled Light Tight Ø10×0.5mm 5pcs8

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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