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VD0657 Vanadium Chromium Evaporation Materials, V/Cr

Catalog No.VD0657
MaterialVanadium Chromium (V/Cr)
Purity99.9%
ShapePowder/ Granule/ Custom-made

Thin-Film Mat Engineering (TFM) is a top-tier provider of high-purity vanadium-chromium evaporation materials, along with an extensive selection of other evaporation products. Our materials are available in both powder and granule forms, and we can also create customized solutions to meet your specific needs.

MSDS File

Vanadium-Chromium Evaporation Materials Overview

Thin-Film Mat Engineering (TFM) offers high-purity vanadium-chromium evaporation materials, which are essential for achieving exceptional quality in thin-film deposition processes. Composed of vanadium (V) and chromium (Cr), these materials are produced with a purity level up to 99.9995%, ensuring reliable performance and superior film quality. TFM employs stringent quality assurance practices to maintain the highest standards.

Applications

Vanadium-chromium evaporation materials are utilized in a variety of applications, including:

  • Deposition Processes: Perfect for semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optical Coatings: Ideal for wear-resistant coatings, decorative finishes, and display applications.

Packaging

Our vanadium-chromium evaporation materials are meticulously packaged to prevent damage during storage and transportation. Each package is clearly labeled for easy identification and to ensure quality control.

Contact Us

Thin-Film Mat Engineering (TFM) provides vanadium-chromium evaporation materials in various forms, including tablets, granules, rods, and wires. We also offer custom solutions tailored to your specific requirements. In addition to these materials, we supply evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For pricing information or to inquire about materials not listed, please contact us directly.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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