Gallium Evaporation Materials are high-purity gallium (Ga) materials specifically prepared for use in vacuum evaporation and thin-film deposition processes, including thermal evaporation and electron beam (e-beam) evaporation. Gallium is a key elemental source in the fabrication of compound semiconductors and functional thin films, where precise composition control and material purity are critical.
Gallium is characterized by its low melting point (~29.8 °C) and excellent chemical reactivity with elements such as arsenic, nitrogen, phosphorus, and oxygen. When used as an evaporation material, it enables stable vapor generation and uniform film growth under controlled vacuum conditions, making it indispensable in advanced electronic and optoelectronic manufacturing.
Detailed Description
Gallium evaporation materials are typically supplied in high-purity grades (3N–6N) to minimize contamination during deposition. Common physical forms include pieces, pellets, shots, or granules, optimized for different evaporation sources and crucible designs.
High material purity ensures:
Reduced oxygen and metallic impurities in deposited films
Improved electrical and optical performance of Ga-based layers
Better reproducibility in R&D and pilot-scale production
Careful material preparation and cleaning are essential, as gallium is sensitive to surface oxidation. Properly processed evaporation materials provide stable evaporation behavior, accurate rate control, and consistent film thickness across substrates.
Applications
Gallium Evaporation Materials are widely used in:
Compound semiconductor fabrication (GaAs, GaN, GaP)
Optoelectronic devices such as LEDs and laser diodes
Thin-film transistors (TFTs) and advanced display technologies
Research and development of III–V semiconductor materials
Specialized coatings requiring gallium-containing layers
Typical Technical Parameters
| Parameter | Typical Value / Range | Importance |
|---|---|---|
| Purity | 99.9% – 99.9999% | Minimizes contamination and defects |
| Form | Pieces / Pellets / Granules | Compatible with various evaporation sources |
| Melting Point | ~29.8 °C | Enables low-temperature evaporation |
| Oxygen Content | ≤ industry-standard limits | Ensures film quality and consistency |
Packaging
Gallium Evaporation Materials are carefully packaged to prevent oxidation and contamination. Each batch is vacuum-sealed or inert-gas packed, labeled for traceability, and protected with suitable cushioning materials to ensure safe storage and international transportation.
Conclusion
Gallium Evaporation Materials provide a reliable, high-purity source for gallium-based thin-film deposition in semiconductor and optoelectronic applications. With controlled purity levels, flexible material forms, and stable evaporation performance, they are well suited for both industrial production and advanced research environments.
For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.
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