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Zinc Oxide (ZnO) Single Crystal Substrate

Introduction

Zinc Oxide (ZnO) Single Crystal Substrate is a wide bandgap semiconductor substrate widely used for epitaxial growth of optoelectronic, piezoelectric, and transparent electronic thin films. With its direct bandgap (~3.37 eV) and high exciton binding energy (~60 meV), ZnO provides an excellent platform for ultraviolet (UV) optoelectronics, transparent conductive devices, and high-frequency acoustic applications.

Due to its wurtzite crystal structure and strong piezoelectric properties, ZnO substrates are also highly attractive for surface acoustic wave (SAW) devices and MEMS applications.


Detailed Description

ZnO crystallizes in a hexagonal wurtzite structure, offering polar and non-polar surface orientations that strongly influence thin film growth behavior. The most commonly used orientation is the c-plane (0001), though a-plane and m-plane cuts are also available for specialized research.

Key material characteristics include:

  • Direct wide bandgap (~3.37 eV at room temperature)

  • High exciton binding energy (~60 meV)

  • Strong piezoelectric and pyroelectric properties

  • High optical transparency in the visible range

  • Good lattice compatibility with ZnO-based epitaxial layers

ZnO Single Crystal Substrates are grown using hydrothermal or melt-based crystal growth techniques to achieve high crystalline quality and low defect density. After slicing, substrates are precision polished to obtain epi-ready surfaces with low roughness suitable for MBE, MOCVD, sputtering, and PLD deposition.

Depending on application requirements, substrates may be supplied as undoped, n-type doped (e.g., Al-doped), or semi-insulating variants.


Applications

Zinc Oxide (ZnO) Substrates are widely used in:

  • UV LEDs and laser diodes

  • Transparent conductive thin films

  • Surface acoustic wave (SAW) devices

  • Piezoelectric MEMS devices

  • Gas and chemical sensors

  • Transparent thin film transistors (TFTs)

  • Photodetectors

  • Optoelectronic research

In ZnO homoepitaxy, lattice matching enables reduced defect density and improved device performance compared with heteroepitaxial growth on sapphire.


Technical Parameters

ParameterTypical Value / RangeImportance
Chemical FormulaZnOWide bandgap semiconductor
Crystal StructureHexagonal WurtziteDetermines anisotropic properties
Orientation(0001), (10-10), (11-20)Influences film growth mode
Bandgap~3.37 eVUV optoelectronic performance
Surface FinishSSP / DSP (Epi-ready optional)Thin film quality
Surface Roughness< 0.5 nm (epi-ready)Uniform epitaxy
Size5×5 mm – 20×20 mm (custom)Deposition compatibility
Thickness0.3 mm – 1.0 mmMechanical stability

Comparison with Related Materials

MaterialKey AdvantageTypical Application
ZnODirect bandgap + strong piezoelectricityUV optoelectronics & SAW
Sapphire (Al₂O₃)High thermal stabilityZnO heteroepitaxy
GaNWide bandgap semiconductorLEDs & power devices
SiMature semiconductor platformElectronics integration

Compared with sapphire, ZnO substrates provide better lattice matching for ZnO-based thin films, reducing dislocation density. Compared with GaN, ZnO offers stronger excitonic effects and excellent transparency.


FAQ

QuestionAnswer
What orientations are available?Common orientations include c-plane (0001), a-plane, and m-plane.
Is ZnO suitable for UV devices?Yes, its wide bandgap and high exciton binding energy make it ideal for UV optoelectronics.
Can doped substrates be supplied?Yes, n-type doped or semi-insulating variants are available upon request.
Is the surface epi-ready?Yes, precision polishing ensures low roughness suitable for epitaxial growth.
How is it packaged?Each substrate is individually packaged in clean, protective containers to prevent contamination and mechanical damage.

Packaging

Our Zinc Oxide (ZnO) Single Crystal Substrates are meticulously tagged and labeled externally to ensure efficient identification and maintain high standards of quality control. Special care is taken to protect the polished surfaces during storage and transportation, ensuring optimal condition upon arrival.


Conclusion

Zinc Oxide (ZnO) Single Crystal Substrate provides a high-quality wide bandgap semiconductor platform for UV optoelectronics, piezoelectric devices, and transparent electronic applications. With multiple orientation options, excellent crystalline quality, and epi-ready surface preparation, ZnO substrates support advanced research and device development.

For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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