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ST0125 Zirconium Aluminum Sputtering Target, Zr/Al

Chemical Formula: Zr/Al
Catalog Number: ST0125
CAS Number: 7440-67-7 | 7429
Purity: 99.5%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Zirconium Aluminum sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

MSDS File

Zirconium Aluminum Sputtering Target Description

The Zirconium Aluminum Sputtering Target from TFM is an alloy sputtering material composed of Zr and Al.

Zirconium

Zirconium, a chemical element, derives its name from the Persian word ‘zargun,’ which translates to ‘gold colored.’ Its existence was first documented in 1789 by H. Klaproth, while J. Berzelius later achieved and declared its isolation. Zirconium is represented by the chemical symbol “Zr” and holds the atomic number 40 in the periodic table. Positioned in Period 5 and Group 4, it belongs to the d-block elements. The atomic mass of zirconium is noted as 91.224(2) Dalton, with the numbers in parentheses indicating the uncertainty of this measurement.

Related Product: Zirconium (Zr) Sputtering Target

AluminumAluminium, often referred to as aluminum in some regions, is a chemical element that traces its etymology to the Latin word ‘alumen,’ meaning bitter salt. It was first recognized in 1825 by H.C. Ørsted, who not only identified but also isolated the element. Aluminium is denoted by the chemical symbol “Al” and carries an atomic number of 13 in the periodic table. It is positioned in Period 3 and Group 13, categorizing it within the p-block of elements. The atomic mass of aluminium is precisely recorded as 26.9815386(8) Dalton, with the figure in parentheses capturing the slight uncertainty of this measurement.

Related Product: Aluminium (Al) Sputtering Target

Zirconium Aluminum Sputtering Target Application

The Zirconium Aluminum Sputtering Target is utilized across various industries for thin film deposition. It plays a crucial role in the enhancement of semiconductor devices, displays, LEDs, and photovoltaic systems. Additionally, it is used in the decorative and functional coating of materials within the optical data storage sector. This sputtering target is also essential in the glass coating industry, including applications in automotive and architectural glass. Moreover, it supports technologies in optical communication and other related fields.

Zirconium Aluminum Sputtering Target Packing

Our Zirconium Aluminum Sputtering Targets are meticulously tagged and labeled externally to ensure easy identification and maintain strict quality control. We take extensive precautions to prevent any damage during storage and transportation, ensuring the integrity of our products upon delivery.

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TFM offers Zirconium Aluminum Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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