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Zirconium Diboride Evaporation Materials

VD0840 Zirconium Diboride Evaporation Materials, ZrB2

Catalog No.VD0840
MaterialZirconium Boride (ZrB2)
Purity99.5%
ShapePowder/ Granule/ Custom-made

TFM stands out as a premier provider of high-purity zirconium diboride for evaporation applications, alongside an extensive range of other evaporation materials. Our offerings include both powder and granule forms, with the option for customized solutions tailored to meet specific needs. Whether you require standard or bespoke formats, TFM is committed to delivering top-quality materials to support your unique requirements.

MSDS File

Zirconium Diboride Evaporation Materials Overview

Zirconium diboride (ZrB2) is a high-purity boride ceramic used extensively in evaporation processes. At TFM, we produce zirconium diboride materials with a purity of up to 99.9995%, ensuring superior quality in film deposition. Our meticulous manufacturing processes support reliable and high-performance results across various applications.

Specifications of Zirconium Diboride Evaporation Materials

Material TypeZirconium diboride
SymbolZrB2
Appearance/ColorGrey-black Solid
Melting Point~3246 °C
Density6.085 g/cm3
Purity99.5%
ShapePowder/ Granule/ Custom-made

Applications of Zirconium Diboride Evaporation Materials

Zirconium diboride evaporation materials are crucial in several deposition techniques, including:

  • Semiconductor Deposition: Used for creating high-performance semiconductor films.
  • Chemical Vapor Deposition (CVD): Applied in forming thin films for various industrial applications.
  • Physical Vapor Deposition (PVD): Ideal for coating processes to enhance durability and functionality.

These materials are particularly suited for optical applications such as wear-resistant coatings, decorative finishes, and display technologies.

Packaging and Handling

To ensure the highest quality, zirconium diboride evaporation materials are carefully packaged and labeled for efficient identification and quality control. Our packaging solutions protect the materials from damage during storage and transport.

Contact Us

TFM is a leading supplier of high-purity zirconium diboride evaporation materials. We offer products in various forms, including tablets, granules, rods, and wires, with customization options available. Additionally, we provide evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For current pricing and inquiries about other materials, please contact us directly.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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