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Zirconium Evaporation Materials, Zr

Material: Zirconium
Chemical Formula: Zr
Catalog No.: TFM-EVM-0367
Purity: 99% ~ 99.5%
Color/Appearance: Silvery White, Metallic
Shape: Powder/ Granule/ Custom-made

Zirconium evaporation material is supplied by Thin Film Materials (TFM) for vacuum evaporation and thin-film deposition. Available form, size, purity, and packaging can be customized to suit research and production requirements.

Product Overview

Zirconium Evaporation Materials (Zr) is supplied as a high-purity evaporation source for PVD processes that require refractory metallic thin films. Because refractory metals have high melting temperatures and low vapor pressures, electron-beam evaporation is often more practical than simple resistance heating. Purity, source form, charge size, crucible or hearth compatibility, and the required deposition rate should therefore be considered together when specifying the material.

Evaporation Behavior and Process Considerations

Electron-beam evaporation is commonly considered because it can concentrate heat directly on the charge without requiring the entire source holder to reach the material’s melting temperature. For high-melting metals, stable hearth cooling, charge placement, beam rastering, and conservative initial conditioning help reduce spitting and local overheating. The film deposition rate should be stabilized before opening the substrate shutter.

Technical Data

ParameterTypical Value / RangeImportance
MaterialZirconium (Zr)Base metal for zirconium thin films
Purity99.9% – 99.99%Minimizes contamination and defects
FormPellets, pieces, granules, wireCompatible with various evaporation sources
Melting Point~1855 °CInfluences evaporation method selection
Evaporation MethodThermal / E-beamFlexible PVD process compatibility
Oxygen ContentControlled (low ppm)Critical for film quality and consistency
MaterialKey AdvantageTypical Application
Zirconium (Zr)Strong adhesion, corrosion resistanceOptical & protective coatings
Titanium (Ti)Excellent adhesionGeneral-purpose PVD films
Hafnium (Hf)Higher temperature stabilityHigh-end optical coatings
QuestionAnswer
What evaporation methods are suitable for zirconium?Both thermal evaporation and electron-beam evaporation are commonly used.
Can zirconium be used for reactive evaporation?Yes, it is frequently used with oxygen or nitrogen to form compound films.
Are custom forms available?Yes, size, shape, and form can be customized.
How should zirconium materials be stored?In vacuum-sealed or inert packaging to prevent oxidation.
Is zirconium suitable for optical applications?Yes, zirconium films and compounds are widely used in optical coatings.

Typical Thin-Film Applications

  • Refractory metallic films, electrodes, diffusion barriers, and high-temperature device layers
  • Semiconductor, sensor, optical, and vacuum-device thin-film structures
  • Research requiring dense metallic coatings with high thermal stability

Source Form and Ordering Considerations

For quotation, provide material, purity, source form, particle or piece size, quantity, evaporation method, and any boat, basket, crucible, or e-beam hearth constraints. If the material will be used for a specific coating stack, sharing the intended film thickness or deposition application can help with source-form selection and packaging recommendations.

Frequently Asked Questions

Is Zirconium better suited to thermal or e-beam evaporation?

Because refractory metals have high melting temperatures and low vapor pressures, electron-beam evaporation is often the more practical method. The final choice depends on the required rate, charge size, and evaporator design.

What source form is commonly used for Zirconium evaporation?

Pieces, pellets, granules, or other compact charge forms can be supplied depending on the e-beam hearth or crucible geometry. The charge should fit securely and heat evenly.

Why is preconditioning important before evaporating Zirconium?

Gradual preheating helps remove adsorbed gases, stabilize the charge, and establish a repeatable evaporation rate before the substrate is exposed.

Can Zirconium react with the crucible or hearth?

Source compatibility depends on temperature and the chosen holder material. For high-temperature evaporation, the crucible or hearth design should be reviewed to minimize reaction, contamination, or wetting problems.

Does higher purity improve Zirconium thin films?

Higher purity can reduce unwanted metallic and nonmetallic contamination in the deposited layer. The required grade should be selected from the film’s contamination limits and device requirements.

What should I provide for a Zirconium evaporation-material RFQ?

Provide purity, source form, piece or pellet size, quantity, evaporation method, hearth or crucible constraints, and any film-purity or documentation requirements.

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Zirconium (Zr) Pieces ~3 mm 3N per kg

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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