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ST0425 Barium Cerium Yttrium Zirconate Sputtering Target, BZCY

Chemical Formula: BaCe(1-x-y)Y(x)Zr(y)O3
Catalog Number: ST0425
Purity: 99.9%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Barium Cerium Yttrium Zirconate sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

MSDS File

Barium Cerium Yttrium Zirconate Sputtering Target Description

The barium cerium yttrium zirconate sputtering target is composed of barium, cerium, yttrium, zirconium, and oxide, with the chemical formula BZCY or BaCe(1-x-y)Y(x)Zr(y)O3. High-purity barium cerium yttrium zirconate sputtering targets are crucial in deposition processes to ensure the production of high-quality films. At TFM, we specialize in producing sputtering targets with up to 99.9995% purity, employing stringent quality assurance processes to guarantee product reliability.

Related products: Barium Sputtering Target, Cerium Sputtering Target, Yttrium Sputtering Target, Zirconium Sputtering Target

Barium Cerium Yttrium Zirconate Sputtering Target Specification

Material TypeBarium Cerium Yttrium Zirconate Sputtering Target
SymbolBaCe(1-x-y)Y(x)Zr(y)O3
Color/AppearanceSolid
Melting PointN/A
SputterRF, DC
Type of BondElastomer, Indium
SynonymsBCZY, BZCY721, BZCY72, yttrium and cerium-doped barium zirconium oxide, ceria- and yttria-substituted barium zirconate
Available SizesDia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets; please Contact Us for more information.

Barium Cerium Yttrium Zirconate Sputtering Target Packaging

Our barium cerium yttrium zirconate sputtering targets are carefully handled to prevent damage during storage and transportation, ensuring the preservation of the products in their original condition. Each target is packaged meticulously to maintain its quality and integrity.

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TFM offers Barium Cerium Yttrium Zirconate Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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