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ST0003A Barium Oxide Sputtering Targets

MSDS File

Barium Oxide Sputtering Targets

Material Properties

  • Material Type: Barium Oxide (BaO)
  • Color/Appearance: White, Crystalline Solid
  • Melting Point: 1,923°C
  • Theoretical Density: 5.72 g/cc
  • Solubility in Water (20°C): 3.48 g/100mL
  • Sputter Types: RF, DC
  • Maximum Power Density: Please inquire for specific limits.
  • Bonding Types: Indium, Elastomer

Specifications

  • Purity: 99.9%
  • Circular: Diameter ≤ 14 inches, Thickness ≥ 1 mm
  • Block: Length ≤ 32 inches, Width ≤ 12 inches, Thickness ≥ 1 mm

Applications

  • Ferroelectric Materials
  • Gate Dielectric Layers
  • CMOS (Complementary Metal-Oxide-Semiconductor)

Features

  • High Purity: Ensures quality thin-film deposition with excellent uniformity.
  • Custom Sizes: Available to meet your specific needs, including for research and development applications.

Manufacturing Process

  • Cold Pressed & Sintered: Our Barium Oxide targets are made using cold pressing and sintering techniques for optimal performance.
  • Elastomer Bonding: Bonds are created with elastomer materials to ensure durability and stability.
  • Cleaning & Packaging: Thorough cleaning and vacuum-ready packaging to prevent contamination and protect during shipment.

Available Options

  • 99.9% Minimum Purity
  • Smaller Sizes: Custom sizes available for R&D or specialized applications.
  • Target Bonding Service: In-house bonding options, including elastomer bonding for enhanced target reliability.

For more details or to inquire about our Barium Oxide Sputtering Targets, please contact us.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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