ST0907 Cadmium Stannate Sputtering Targets, Cd2SnO4

Chemical FormulaCd2SnO4
Catalog No.ST0907
CAS Number12185-56-7
Purity99.9%, 99.95%, 99.99%, 99.995%, 99.999%
ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

Cadmium Stannate sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

Cadmium Stannate Sputtering Targets Description

Cadmium Stannate Sputtering Target is a specialized material employed in the sputter deposition process to create thin films for various applications in electronics, optics, and other industries. During sputtering, high-energy ions bombard the target material, ejecting atoms or molecules from its surface. These ejected particles then deposit onto a substrate, forming a thin film.

Cadmium Stannate (Cd₂SnO₄) is a compound composed of cadmium (Cd), tin (Sn), and oxygen (O). It is recognized for its distinctive electrical and optical properties, which make it ideal for applications in transparent conductive films.

Related Product: Cadmium Selenide Sputtering Target, Cadmium Telluride Sputtering Target, Cadmium Sputtering Target

Cadmium Stannate Sputtering Targets Specifications

Compound FormulaCd2SnO4
Molecular Weight407.49
Appearancewhite solid
Melting PointN/A
DensityN/A
Available SizesDia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Cadmium Stannate Sputtering Targets Application

Cadmium Stannate Sputtering Target is ideal for applications involving transparent conducting films. The thin film produced using this target is both transparent and electrically conductive, making it suitable for use in transparent electrodes for displays, solar cells, and other electronic devices.

Cadmium Stannate Sputtering Targets Packaging

Our Cadmium Stannate Sputtering Targets are meticulously handled throughout storage and transportation to maintain their quality and ensure they arrive in optimal condition.

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TFM offers Cadmium Stannate Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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