Product Overview
Calcium Titanate Sputtering Targets is a composition-specific sputtering target for thin-film deposition and PVD process development. The practical specification normally includes chemistry, purity, dimensions, density, target configuration, and any bonding or backing requirement needed by the sputtering cathode.
Material and Deposition Characteristics
Power mode and process conditions should be selected according to the target conductivity, thermal behavior, and the requirements of the cathode system. For less common materials, conservative initial power density and film-composition verification are good practice.
Technical Data
| Parameter | Typical Value / Range | Importance |
|---|---|---|
| Chemical Formula | CaTiO₃ | Determines perovskite crystal structure |
| Purity | ≥ 99.9% | Ensures stable dielectric and electronic properties |
| Diameter | 25 – 300 mm (custom) | Compatible with standard sputtering systems |
| Thickness | 3 – 6 mm | Influences sputtering stability and target lifetime |
| Density | ≥ 95% theoretical density | Ensures uniform film deposition |
| Bonding | Copper backing plate / Indium bonded | Improves heat dissipation during sputtering |
| Material | Key Advantage | Typical Application |
|---|---|---|
| Calcium Titanate (CaTiO₃) | Stable dielectric properties and perovskite structure | Microwave and electronic ceramics |
| Barium Titanate (BaTiO₃) | High dielectric constant | Capacitors and ferroelectric devices |
| Strontium Titanate (SrTiO₃) | Excellent lattice matching for oxide films | Substrates and electronic devices |
| Question | Answer |
|---|---|
| What sputtering methods are suitable for CaTiO₃ targets? | Calcium titanate targets are typically used in RF magnetron sputtering systems designed for ceramic materials. |
| Can the target size be customized? | Yes. Diameter, thickness, and bonding configurations can be customized according to system requirements. |
| Are bonded sputtering targets available? | Yes. CaTiO₃ ceramic targets can be bonded to copper backing plates to improve thermal conductivity and stability during sputtering. |
| What substrates are suitable for CaTiO₃ thin films? | Films can be deposited on silicon wafers, glass, ceramic substrates, and other oxide materials. |
| What industries commonly use CaTiO₃ sputtering targets? | Electronics manufacturing, microwave device production, functional oxide research, and advanced materials development. |
Typical Thin-Film Applications
- Thin-film research and materials-development projects requiring a composition-specific sputtering source
- Semiconductor, optical, energy, electronic, or laboratory coatings depending on the material system
- Custom R&D work where target composition, purity, and geometry need to be specified together
Target Configuration and Ordering Considerations
For quotation and manufacturability review, provide target size, thickness, purity or alloy composition, quantity, and the sputtering gun or cathode model if known. If a bonded assembly is required, include backing-plate material, bonding preference, and any dimensional tolerances, surface-finish needs, or inspection-document requirements. TFM can also review customer drawings or old-target samples for replacement builds.
Frequently Asked Questions
What is the main reason to use a Calcium Titanates sputtering target?
It provides a composition-specific source for thin-film deposition when the target material itself is important to the desired film chemistry or process.
How should the sputtering mode for Calcium Titanates be selected?
The power mode should be chosen according to target conductivity, thermal behavior, and equipment capability. Less-conductive materials are commonly evaluated with RF power.
Why are density and microstructure important for Calcium Titanates targets?
These factors can influence erosion stability, thermal behavior, particle generation, and the risk of cracking or local hot spots.
Can Calcium Titanates be supplied with a backing plate?
Yes. If the material is brittle or the cathode requires it, a bonded configuration can be reviewed according to target size, thickness, cooling, and power.
Does target composition always equal film composition?
No. Film chemistry may differ because of sputtering yields, process conditions, substrate temperature, re-sputtering, and chamber history. Film verification is recommended when composition matters.
What should I provide to request a quotation for Calcium Titanates?
Please provide the composition, purity, dimensions, quantity, target configuration, cathode details, and any drawing or inspection requirements.
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