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VD0607 Chromium Molybdenum Evaporation Materials, Cr/Mo

Catalog No.VD0607
MaterialChromium Molybdenum (Cr/Mo)
Purity99.9% ~ 99.95%
ShapePowder/ Granule/ Custom-made

TFM is a trusted provider of high-purity chromium molybdenum evaporation materials, catering to a wide range of industrial needs. As a leading manufacturer and supplier, TFM offers these materials in various forms, including powder, granules, and customized shapes, ensuring flexibility for specific application requirements.

MSDS File

Chromium Molybdenum Evaporation Materials: An Overview

High-purity chromium molybdenum evaporation materials are essential for achieving superior quality in film deposition processes. At TFM, we excel in producing chromium molybdenum materials with purities reaching up to 99.9995%. Our commitment to quality assurance ensures that our products meet rigorous standards for reliability and performance.

Specifications of Chromium Molybdenum Evaporation Materials

  • Material Type: Chromium Molybdenum
  • Color/Appearance: Gray
  • Purity: Ranges from 99.9% to 99.9995%
  • Form: Available as powder, granules, or custom-made shapes

Applications for Chromium Molybdenum Evaporation Materials

Chromium molybdenum evaporation materials are versatile and used in various applications, including:

  • Deposition Processes: Ideal for semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optical Uses: Suitable for wear protection, decorative coatings, and display technologies.

Packaging and Handling

Our chromium molybdenum evaporation materials are meticulously packaged to prevent any damage during storage and transport. We ensure that our products retain their high quality and are delivered in optimal condition.

Contact Us

TFM is a leading provider of high-purity chromium molybdenum evaporation materials and other deposition products. We offer materials in both powder and granule forms, with custom options available upon request. For current pricing and to inquire about our full range of deposition materials, please reach out to us directly.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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