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holmium-oxide

VD0689 Holmium Oxide Evaporation Materials, Ho2O3

Catalog No.VD0689
MaterialHolmium Oxide (Ho2O3)
Purity99.9% ~ 99.99%
ShapePowder/ Granule/ Custom-made

TFM stands out as a premier provider of high-purity holmium(III) oxide and other evaporation materials. We supply these materials in both powder and granule formats, with custom options available to meet specific requirements. Whether you’re looking for standard or tailored solutions, TFM is dedicated to delivering top-quality products to suit your needs.

 

MSDS File

Holmium Oxide Evaporation Materials Overview

Holmium(III) oxide, or Ho₂O₃, is a rare-earth compound celebrated for its distinctive properties and versatile applications. Also known as holmia, this compound is recognized for its strong paramagnetic behavior, particularly in comparison to dysprosium(III) oxide (Dy₂O₃). Holmium oxide frequently occurs alongside other lanthanide oxides, such as erbium oxide, in natural minerals. Extracting these oxides requires specialized separation techniques due to their common coexistence.

In terms of visual characteristics, holmium oxide exhibits notable color shifts depending on the lighting. It appears light yellow in daylight but changes to a vibrant orange-red under trichromatic light. This color variation is due to the sharp emission bands of the phosphors. Although it has a wide band gap of 5.3 eV, which might suggest a colorless appearance, the yellow hue is a result of lattice defects and transitions at the Ho³⁺ ions.

Specifications of Holmium Oxide Evaporation Materials

Material TypeHolmium Oxide
SymbolHo2O3
Color/AppearanceLight yellow
Melting Point2415 °C (4379 °F)
Type of BondIndium, Elastomer
Density3.79 g/cm3

Applications

  • Specialty Glasses: Holmium oxide is utilized in producing specialty colored glasses, known for their sharp optical absorption peaks within the visible spectrum. It is commonly used as a calibration standard for optical spectrophotometers.
  • Deposition Processes: This material is integral to various deposition techniques, including semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optics: Holmium oxide is employed in optical applications such as wear protection, decorative coatings, and display technologies.

Packaging

Our holmium oxide evaporation materials are carefully packaged to maintain their quality and prevent damage during storage and transportation.

Contact Us

TFM specializes in high-purity holmium oxide evaporation materials with the highest density and smallest average grain sizes. Our products are ideal for semiconductor applications, CVD, PVD, and optical displays. Reach out to us for inquiries and further information.

Ordering Table

Material Size Quantity Purity Part Number
Hafnium Oxide 10 - 12 mm Dia. x 4 - 5mm thick 25 g 99.9% EVMHFO2TABA
Hafnium Oxide 10 - 12 mm Dia. x 4 - 5mm thick 50 g 99.9% EVMHFO2TABB
Hafnium Oxide 10 - 12 mm Dia. x 4 - 5mm thick 100 g 99.9% EVMHFO2TABD
Hafnium Oxide 10 - 12 mm Dia. x 4 - 5mm thick 1 kg 99.9% EVMHFO2TABKG
Hafnium Oxide 10 - 12 mm Dia. x 4 - 5mm thick 500 g 99.9% EVMHFO2TABT
Hafnium Oxide 1mm - 3mm Pieces 50 g 99.9% EVMHFO21-3B
Hafnium Oxide 1mm - 3mm Pieces 100 g 99.9% EVMHFO21-3D
Hafnium Oxide 1mm - 3mm Pieces 200 g 99.9% EVMHFO21-3H

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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