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ST0309 Indium (III) Selenide Sputtering Target, In2Se3

Chemical Formula: In2Se3
Catalog Number: ST0309
CAS Number: 12056-07-4
Purity: 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Indium (III) Selenide sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

MSDS File

Indium (III) Selenide Sputtering Target Description

An Indium (III) Selenide Sputtering Target is a type of ceramic material composed of indium and selenium, used in sputtering processes. This target is typically employed in thin film deposition and various specialized applications due to the unique properties of the indium-selenium combination.

Indium

Indium is a chemical element with the symbol “In” and an atomic number of 49. The name “indium” is derived from the Latin word ‘indicium,’ meaning violet or indigo, referring to its indigo spectral line. It was first mentioned in 1863 by Ferdinand Reich and Theodor Richter, with its isolation later accomplished and announced by Theodor Richter. Indium is located in Period 5 and Group 13 of the periodic table, belonging to the p-block elements. Its relative atomic mass is approximately 114.818 Daltons, with the number in parentheses indicating a margin of uncertainty.

Indium compounds are evaporated under vacuum to form thin films used in the production of electronics and photovoltaic cells. Pure indium is also used as a film layer in semiconductors.

Related Product: Indium (In) Sputtering Target

SeleniumSelenium is a chemical element with the symbol “Se” and an atomic number of 34. The name “selenium” comes from the Greek word ‘selene,’ meaning moon. It was first mentioned in 1817 and observed by Jöns Jacob Berzelius and Johan Gottlieb Gahn, who also accomplished and announced its isolation. Selenium is located in Period 4 and Group 16 of the periodic table, classified within the p-block elements. Its relative atomic mass is approximately 78.96 Daltons, with the number in parentheses indicating a margin of uncertainty.

Related Product: Selenium (Se) Sputtering Target

Indium (III) Selenide Sputtering Target Specification

Compound FormulaIn2Se3
AppearanceBlack solid
Density5.80 g/cm3
Melting Point890 °C
Available SizesDia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Indium (III) Selenide Sputtering Target Application

The Indium (III) Selenide Sputtering Target is used in a variety of applications, including thin film deposition and decorative coatings. It is widely employed in the semiconductor industry, display technologies, and the production of LEDs and photovoltaic devices. Additionally, this material is significant for functional coatings, the optical information storage industry, glass coatings for automotive and architectural purposes, and optical communication technologies.

Indium (III) Selenide Sputtering Target Packing

Our Indium (III) Selenide Sputtering Targets are meticulously tagged and labeled externally to ensure efficient identification and maintain high standards of quality control. We take extensive precautions to prevent any potential damage during storage and transportation, ensuring the targets arrive in perfect condition.

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TFM offers Indium (III) Selenide Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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