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VD0561 Magnesium Evaporation Materials, Mg

Material Type: Magnesium
Symbol: Mg
Color/Appearance: Silvery White, Metallic
Purity: 99.9% ~ 99.99%
Shape: Powder/ Granule/ Custom-made

TFM is a top manufacturer and supplier of high-purity magnesium evaporation materials, along with a diverse range of other evaporation materials. We provide our products in both powder and granule forms, and offer customized options to meet specific needs upon request.

 

MSDS File

Magnesium Evaporation Materials

Introduction

Magnesium Evaporation Materials are widely used as a source for thin film deposition in optical, electronic, and protective coatings. Magnesium’s low density, high reactivity, and excellent transparency to visible and infrared light make it an important material for industries such as semiconductors, optics, and energy devices. When deposited as a thin film, magnesium offers unique properties for lightweight coatings, dielectric layers, and compound films such as magnesium oxide (MgO).

Detailed Description

Magnesium evaporation sources are typically supplied in the form of pellets, pieces, granules, or rods, optimized for both thermal evaporation and electron beam (e-beam) evaporation systems.

Key features include:

  • High Purity (99.9%–99.99%): Ensures contamination-free coatings for research and industrial production.

  • Low Density (1.74 g/cm³): Ideal for lightweight thin film applications.

  • Relatively Low Melting Point (650 °C): Enables efficient evaporation under controlled conditions.

  • Excellent Optical Transparency: Suitable for optical coatings across UV, visible, and IR ranges.

  • Reactivity: Forms compounds such as MgO, useful for dielectric and protective layers.

Applications

Magnesium evaporation materials are widely applied in:

  • Optical Coatings: Anti-reflective and dielectric films on glass, lenses, and display panels.

  • Semiconductors & Microelectronics: Passivation layers and compound semiconductor thin films.

  • Energy Devices: Thin films for solid-state batteries, photovoltaics, and fuel cells.

  • Protective Coatings: Oxidation-resistant and barrier layers.

  • R&D: Material science experiments and nanotechnology thin film studies.

Technical Parameters

ParameterTypical Value / RangeImportance
Purity99.9% – 99.99%Higher purity yields reliable thin films
Forms AvailablePellets, granules, rods, piecesCompatible with various evaporation systems
Melting Point650 °CRelatively low, suitable for efficient evaporation
Density1.74 g/cm³Enables lightweight thin film coatings
Evaporation MethodThermal / e-beamProvides flexibility in deposition processes

Comparison with Related Materials

MaterialKey AdvantageTypical Application
Magnesium (Mg)Lightweight, reactive, transparentOptical & protective coatings
Aluminum (Al)High reflectivity, cost-effectiveMirrors, microelectronics
Calcium (Ca)High reactivity, forms stable oxidesDielectric & optical films

FAQ

QuestionAnswer
What forms are available?Magnesium is offered in pellets, rods, granules, or custom-shaped pieces.
Can purity be customized?Yes, 99.9% and 99.99% grades are standard, higher purities available upon request.
How is it packaged?Vacuum-sealed or argon-filled containers with desiccants, shipped in export-safe cartons.
What is the delivery time?Typically 2–3 weeks, depending on order size and customization.
Which industries use it most?Optics, semiconductors, energy, aerospace, and R&D.

Packaging

Because magnesium is sensitive to oxidation, all evaporation materials are vacuum-sealed or inert-gas protected. Containers are clearly labeled with purity, form, and lot number to ensure traceability. Additional protective cartons or wooden crates are used for international shipment.

Conclusion

The Magnesium Evaporation Materials provide a reliable source for producing lightweight, transparent, and high-purity thin films. With excellent optical and electronic properties, magnesium remains a key evaporation material for optics, microelectronics, energy storage, and advanced R&D applications.

For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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