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VD0562 Manganese Evaporation Materials, Mn

Material Type: Manganese
Symbol: Mn
Purity: 99.5% ~ 99.95%
Shape: Powder/ Granule/ Custom-made

TFM offers manganese evaporation materials in a variety of forms, purities, sizes, and price ranges. We are experts in producing high-purity e-beam evaporation materials, characterized by optimal density and minimal average grain sizes. For current pricing on evaporation pellets and other deposition materials not listed, please send us an inquiry.

 

MSDS File

Manganese Evaporation Material Description

Manganese is a gray-white, hard, brittle, and shiny transition metal. Pure manganese is slightly softer than iron, while manganese with minor impurities is firm and brittle. This element is widely found in nature, with soil containing approximately 0.25% manganese, and higher concentrations found in tea, wheat, and hard-shelled fruits.

High-purity manganese evaporation materials play a crucial role in deposition processes, ensuring the production of high-quality deposited films. TFM specializes in producing manganese evaporation materials with purity levels of up to 99.95%, employing quality assurance processes to guarantee product reliability.

manganese evaporation materials

Manganese Evaporation Material Specification

Material TypeManganese
SymbolMn
Color/AppearanceMetallic Solid
Melting Point1024°C
Density6800 kg/m3
Thermal Conductivity0.165 W/cm/K @ 25 °C
Electrical Resistivity64.0 microhm-cm @ 25°C
SynonymsMn Pellets, Mn Pieces, Mn Evaporation Pellet, Manganese Pellets, Manganese Pieces, Manganese Evaporation Pellet

Manganese Evaporation Material Applications

Manganese evaporation materials are pivotal in various advanced applications, including:

  • Deposition Processes: Utilized in semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD) to create high-quality, uniform films.
  • Optics: Employed in the production of optical coatings, wear-resistant layers, and decorative finishes to enhance performance and durability.

Manganese Evaporation Material Packaging

We carefully manage the handling of our manganese evaporation materials to avoid damage during storage and transportation. This meticulous approach ensures that the quality and integrity of our products are preserved in their original condition.

 

Get Contact

TFM offers manganese evaporation materials in a variety of forms, purities, sizes, and price ranges. We are experts in producing high-purity e-beam evaporation materials, characterized by optimal density and minimal average grain sizes. For current pricing on evaporation pellets and other deposition materials not listed, please send us an inquiry.

Ordering Table

Material Size Quantity Purity Part Number
Manganese 3mm - 12mm Pieces 1 kg 99.95% EVMMNM1034
Manganese 3mm - 12mm Pieces 50 g 99.95% EVMMNM1034B
Manganese 3mm - 12mm Pieces 200 g 99.95% EVMMNM1034H
Manganese 3mm - 12mm Pieces 500 g 99.95% EVMMNM1034T

 

 

 

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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