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Manganese Evaporation Materials

VD0562 Manganese Evaporation Materials, Mn

Material Type: Manganese
Symbol: Mn
Purity: 99.5% ~ 99.95%
Shape: Powder/ Granule/ Custom-made

TFM offers manganese evaporation materials in a variety of forms, purities, sizes, and price ranges. We are experts in producing high-purity e-beam evaporation materials, characterized by optimal density and minimal average grain sizes. For current pricing on evaporation pellets and other deposition materials not listed, please send us an inquiry.

 

MSDS File

Introduction

Manganese Evaporation Materials (Mn) are widely used in physical vapor deposition (PVD) processes where precise control of composition and film functionality is required. As an important transition metal, manganese plays a critical role in magnetic materials, alloy thin films, functional oxides, and emerging electronic applications. High-purity manganese evaporation materials enable stable evaporation behavior and reproducible thin-film properties, making them essential for both research and advanced industrial coating processes.

Detailed Description

Manganese evaporation materials are produced from refined, high-purity manganese metal and supplied in forms optimized for thermal evaporation, e-beam evaporation, or resistance heating. Typical forms include pellets, granules, pieces, and customized shapes designed to fit standard evaporation boats, crucibles, or liners.

Due to manganese’s relatively high reactivity with oxygen, strict control of raw material purity and processing atmosphere is essential. Carefully prepared Mn evaporation materials exhibit clean surfaces, low impurity levels, and consistent vaporization characteristics, reducing the risk of spitting, contamination, or composition drift during deposition.

In thin-film processes, manganese is often used as a standalone metallic layer or as a precursor for compound films such as manganese oxides or manganese-containing alloys. Deposition parameters—including substrate temperature, evaporation rate, and background pressure—allow engineers to tailor film microstructure, adhesion, and functional performance.

Applications

Manganese evaporation materials are commonly applied in:

  • Magnetic and spintronic thin films

  • Alloy film deposition (Mn-based or Mn-doped alloys)

  • Functional oxide films (via reactive evaporation)

  • Semiconductor and electronic materials research

  • Protective and functional coatings

  • Academic and industrial thin-film R&D

Technical Parameters

ParameterTypical Value / RangeImportance
MaterialManganese (Mn)Core functional element
Purity99.9% – 99.99%Minimizes film contamination
FormPellets, granules, pieces (custom)Fits different evaporation sources
Melting Point~1246 °CInfluences evaporation method
Deposition MethodThermal / E-beam evaporationProcess flexibility
PackagingVacuum-sealedPrevents oxidation

Comparison with Related Evaporation Materials

MaterialKey AdvantageTypical Application
Manganese (Mn)Magnetic and alloy functionalitySpintronics, alloys
Iron (Fe)Strong ferromagnetismMagnetic films
Chromium (Cr)Good adhesion, corrosion resistanceAdhesion layers
Cobalt (Co)High magnetic anisotropyMagnetic devices

FAQ

QuestionAnswer
Can manganese evaporation materials be customized?Yes, purity, size, and shape can be tailored to your evaporation source.
Is manganese suitable for reactive evaporation?Yes, Mn is commonly used with oxygen to form manganese oxide films.
How should manganese be stored?Vacuum-sealed or inert-gas packaging is recommended to avoid oxidation.
Is it suitable for e-beam evaporation?Yes, high-purity Mn can be used in e-beam systems with proper crucibles.
Are small R&D quantities available?Yes, laboratory-scale quantities are supported.

Packaging

Our Manganese Evaporation Materials are carefully cleaned, vacuum-sealed, and clearly labeled to ensure traceability and quality control. Protective cushioning and moisture-resistant packaging are used to prevent oxidation or mechanical damage during storage and international transportation.

Conclusion

Manganese Evaporation Materials (Mn) provide a reliable foundation for depositing magnetic, alloy, and functional oxide thin films. With controlled purity, flexible supply forms, and stable evaporation performance, they are well suited for both cutting-edge research and advanced industrial PVD applications.

For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.

Ordering Table

Material Size Quantity Purity Part Number
Manganese 3mm - 12mm Pieces 1 kg 99.95% EVMMNM1034
Manganese 3mm - 12mm Pieces 50 g 99.95% EVMMNM1034B
Manganese 3mm - 12mm Pieces 200 g 99.95% EVMMNM1034H
Manganese 3mm - 12mm Pieces 500 g 99.95% EVMMNM1034T

 

 

 

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Mn Pellets 3N ø3×3mm (100g), Mn Pellets 3N ø6×6mm (100g)

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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