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VD0569 Praseodymium Evaporation Materials, Pr

Catalog No.VD0569
MaterialPraseodymium (Pr)
Purity99.5% ~ 99.9%
ShapePowder/ Granule/ Custom-made

TFM is a top manufacturer and supplier of high-purity praseodymium evaporation materials, as well as a diverse range of other evaporation products. We provide these materials in both powder and granule forms, with customization options available to meet specific needs.

 

MSDS File

Praseodymium Evaporation Material Description

Praseodymium, a rare earth metal with an atomic number of 59, offers superior corrosion resistance in air compared to lanthanum, cerium, neodymium, and europium. It plays a crucial role in the catalytic cracking of petroleum. In this process, praseodymium, often combined with neodymium, is added to Y-type zeolite molecular sieves to enhance petroleum cracking catalysts, improving their activity, selectivity, and stability.

High-purity praseodymium evaporation materials are vital for producing high-quality deposited films in various deposition processes. TFM specializes in manufacturing praseodymium evaporation materials with purities reaching up to 99.9%, ensuring reliability through rigorous quality assurance procedures.

praseodymium evaporation materials

Praseodymium Evaporation Material Specification

Material TypePraseodymium
SymbolPr
Color/AppearanceSilvery White
Melting Point935 °C
Density935 °C
Thermal Conductivity1.25 W/cm·K
Electrical Resistivity0.7 µΩ-m
SynonymsPr Pellets, Pr Pieces, Pr Evaporation Pellet, Praseodymium Pellets, Praseodymium Pieces, Praseodymium Evaporation Pellet

Praseodymium Evaporation Material Application

These materials are used in several deposition techniques, including semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD). In optics, they are applied for various purposes such as enhancing wear resistance, creating decorative coatings, and improving display technologies.

Praseodymium Evaporation Material Packaging

We handle our praseodymium evaporation materials with utmost care to prevent any damage during storage and transportation, ensuring that the products retain their original quality.

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TFM offers praseodymium evaporation materials in a range of forms, purities, sizes, and price points. We specialize in high-purity e-beam evaporation materials, designed to achieve the highest density and the smallest average grain sizes. For the latest pricing on evaporation pellets and other deposition materials not listed, please contact us with your inquiry.

 

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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