ST0216 Tantalum Nitride Sputtering Target, TaN

Tantalum Nitride Sputtering Target Description

Tantalum Nitride sputtering target from TFM is a ceramic sputtering material with the chemical formula TaN. This material is commonly used in thin film deposition processes for various industrial applications due to its excellent properties, including high hardness, thermal stability, and chemical resistance.

Tantalum is a chemical element with the symbol “Ta,” named after King Tantalus from Greek mythology. It was first identified in 1802 by the Swedish chemist Anders Gustaf Ekeberg. Tantalum has an atomic number of 73, placing it in Period 6 and Group 5 of the periodic table, within the d-block. The element has a relative atomic mass of 180.94788(2) Dalton, where the number in brackets indicates the measurement uncertainty. Tantalum is known for its high melting point and resistance to corrosion, making it valuable in various industrial applications, including electronics and aerospace engineering.

Related Product: Tantalum Sputtering Target

Nitrogen is a chemical element with the symbol “N,” originating from the Greek words ‘nitron’ and ‘genes,’ meaning “nitre-forming.” It was first identified in 1772 by Daniel Rutherford. Nitrogen has an atomic number of 7 and is located in Period 2 and Group 15 of the periodic table, within the p-block. Its relative atomic mass is 14.0067(2) Dalton, with the number in brackets indicating the uncertainty in measurement. Nitrogen is a crucial element in the atmosphere and is essential for life, playing a key role in the structure of proteins and nucleic acids.

Tantalum Nitride Sputtering Target Specification

Tantalum Nitride Sputtering Target Application

The tantalum nitride sputtering target is utilized in various applications, including thin film deposition, decoration, semiconductors, displays, LEDs, and photovoltaic devices. It is also employed for functional coatings in the optical information storage industry, as well as for glass coating applications such as car and architectural glass. Additionally, tantalum nitride is used in optical communication systems. Its versatile properties make it valuable across these industries, particularly for enhancing durability, functionality, and performance in coatings and electronic components.

Tantalum Nitride Sputtering Target Packaging

Our tantalum nitride sputtering target is meticulously tagged and labeled externally to ensure accurate identification and stringent quality control. We take great care in handling and packaging these targets to prevent any potential damage during storage or transportation, thereby preserving the product’s integrity and quality.

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TFM offers Tantalum Nitride Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.