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VD0586 Titanium Evaporation Materials, Ti

Catalog No.VD0586
MaterialTitanium (Ti)
Purity3N-5N
ShapePowder/ Granule/ Custom-made

TFM is a leading manufacturer and supplier of high-purity titanium evaporation materials, as well as a diverse range of other evaporation materials. We offer these materials in both powder and granule forms, and we also provide custom forms upon request.

MSDS File
Titanium Evaporation Materials Description

Titanium is a silvery-white transition metal known for its lightweight nature, high strength, and metallic luster. It has 13 known isotopes, ranging from titanium-41 to titanium-53, with five stable isotopes: titanium-46, titanium-47, titanium-48, titanium-49, and titanium-50. The remaining isotopes are radioactive. Titanium dioxide (TiO₂) is the most common compound, widely used as a white pigment. Other important compounds include titanium tetrachloride (TiCl₄), used as a catalyst and for creating smoke screens, and titanium trichloride (TiCl₃), which is used in the production of polypropylene.

High-purity titanium evaporation materials are essential for achieving top-quality films in deposition processes. TFM specializes in producing titanium evaporation materials with up to 99.995% purity, ensuring high performance and reliability through rigorous quality assurance procedures.

Titanium Evaporation Materials Specification

Material TypeTitanium
SymbolTi
Color/AppearanceSilvery Metallic
Melting Point1,660°C
Theoretical Density4.5(g/cc)
Z Ratio0.628
Thermal Evaporation TechniquesTungsten Boat, TiC Crucible
SynonymsTitanium Pellets, Titanium Pieces, Titanium Evaporation Pellet, T iPellets, Ti Pieces, Ti Evaporation Pellet

Titanium Evaporation Materials Applications

  • Deposition Processes: Utilized in semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optics: Applied in wear protection, decorative coatings, and displays.

Titanium Evaporation Materials Packaging

Our titanium evaporation materials are meticulously handled to prevent damage during storage and transportation, preserving their original quality.

Contact Us

TFM offers titanium evaporation materials in a variety of forms, purities, sizes, and price ranges. We specialize in producing high-purity e-beam evaporation materials with optimal density and minimal average grain sizes. For current pricing on evaporation pellets and other deposition materials not listed, please contact us with your inquiry.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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