ST0520 Tungsten Diboride Sputtering Target, W2B

Chemical Formula: W2B
Catalog Number: ST0520
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Tungsten Diboride sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

Tungsten Diboride Sputtering Target Description

TungstenTungsten is a rare metal found naturally on Earth almost exclusively in chemical compounds rather than in its pure form. Identified as a new element in 1781 and first isolated as a metal in 1783, its significant ores include wolframite and scheelite.

Tungsten has the highest melting point of all elements, at 3422 °C, and the highest boiling point, at 5930 °C. Its density is 19.25 times that of water, comparable to uranium and gold, and about 1.7 times higher than lead. While polycrystalline tungsten is inherently brittle and hard, pure single-crystalline tungsten is more ductile and can be cut with a hard-steel hacksaw.

Related Product: Tungsten Sputtering Target.

Tungsten Diboride Sputtering Target Specifications

Material TypeTungsten Diboride
SymbolW2B
Color/AppearanceSolid
Melting Point/
Density/
Available SizesDia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets; please Contact Us for more information.

Tungsten Diboride Sputtering Target Applications

Semiconductor Manufacturing: Tungsten diboride (WB₂) sputtering targets are essential in the semiconductor industry for thin-film deposition. They are crucial for creating advanced semiconductor devices like integrated circuits (ICs) and microelectromechanical systems (MEMS). The thin films produced serve as conductive layers in modern electronics.

Hard Coatings: WB₂ thin films are valued for their extreme hardness and wear resistance. They are applied as protective coatings on cutting tools, drills, and industrial equipment. These coatings improve the lifespan and performance of tools and machinery in metalworking and machining processes.

Optical Applications: Tungsten diboride coatings enhance the performance of optical lenses and mirrors. They reduce glare, increase reflectivity, and add durability to optical systems used in telescopes, cameras, and other devices.

Aerospace and Defense: WB₂ sputtering targets are used in the aerospace and defense sectors to protect critical components like turbine blades and nozzles from high temperatures, oxidation, and wear. This ensures the reliability and longevity of aerospace components.

Energy Storage: Tungsten diboride is explored for use in energy storage technologies such as lithium-ion batteries and supercapacitors. Its electrical conductivity and high-temperature stability make it a promising candidate for enhancing the performance and safety of energy storage devices, which is crucial for renewable energy systems and electric vehicles.

Packing

Our Tungsten Diboride Sputtering Targets are clearly tagged and labeled to ensure efficient identification and quality control. We take great care to prevent any damage during storage and transportation, preserving the quality of our products in their original condition.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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