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Vanadium Carbide Evaporation Materials

VD0770 Vanadium Carbide Evaporation Materials, VC

Catalog No.VD0770
MaterialVanadium Carbide (VC)
Purity99.5%
ShapePowder/ Granule/ Custom-made

TFM stands out as a premier manufacturer and supplier of high-purity Vanadium Carbide evaporation materials. We provide a diverse range of evaporation materials, available in both powder and granule forms to meet your needs. Additionally, we offer customized solutions tailored to your specific requirements.

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Vanadium Carbide Evaporation Materials Overview

Vanadium Carbide evaporation material, identified by the chemical formula VC, is a high-purity carbide ceramic used in deposition processes. At TFM, we provide Vanadium Carbide with exceptional purity levels, reaching up to 99.9995%. Our rigorous quality assurance measures ensure the reliability and performance of our products in various high-tech applications.

Specifications of Vanadium Carbide Evaporation Materials

Material TypeVanadium Carbide
SymbolVC
Appearance/ColorBlack Solid
Melting Point3,608 °C (6,526 °F; 3,881 K)
Density5.77 g/cm3
Purity99.5%
ShapePowder/ Granule/ Custom-made

Applications of Vanadium Carbide Evaporation Materials

Vanadium Carbide evaporation materials are essential in a variety of applications:

  • Deposition Processes: Utilized in semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD) to create high-quality films.
  • Optics and Coatings: Applied in wear protection, decorative coatings, and display technologies for enhanced durability and performance.

Packaging and Handling

Our Vanadium Carbide evaporation materials are meticulously tagged and labeled to ensure accurate identification and quality control. We prioritize careful packaging to prevent damage during storage and transportation, maintaining the integrity of the material until it reaches its destination.

Contact TFM

TFM is a leading provider of high-purity Vanadium Carbide evaporation materials. We offer a variety of forms including tablets, granules, rods, and wires, with custom shapes and quantities available upon request. In addition to Vanadium Carbide, we supply evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For current pricing and additional information on products not listed, please reach out to us with your inquiry.

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Vanadium Carbide Granules, VC-99.9%, 1~8mm, 100g, Vanadium Carbide Granules, VC-99.9%, 1~8mm, 500g

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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