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ST0056 Ytterbium Sputtering Target, Yb

Chemical Formula: Yb
Catalog Number: ST0056
CAS Number: 7440-64-4
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Ytterbium sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

MSDS File

Ytterbium Sputtering Target Description

Ytterbium

The ytterbium sputtering target shares properties with its source material, ytterbium. Ytterbium is a chemical element named after Ytterby, Sweden. It was first mentioned in 1878 and observed by J.C.G. de Marignac, with its isolation later accomplished and announced by G. Urbain. The canonical chemical symbol for ytterbium is “Yb,” and it has an atomic number of 70. Ytterbium is located in Period 6 and Group 3 of the periodic table, belonging to the f-block. Its relative atomic mass is 173.04 Daltons, with the number in brackets indicating measurement uncertainty.

The ytterbium sputtering target is characterized by its silvery-metallic color and is often classified as a “rare-earth sputtering target.”

Ytterbium Sputtering Target Specification

Atomic Number70
Density6.90 g/cm3 (near r.t.)
Color/AppearanceSilvery White, Metallic
Thermal Conductivity34.9 W/m.K
Melting Point824 °C
Boiling Point1196 °C
Coefficient of Thermal Expansion26.3 x 10-6/K
Z Ratio1.13

Ytterbium Sputtering Target Application

Ytterbium sputtering materials are utilized in various thin-film coating applications, including:

  • CD-ROM production
  • Decorative coatings
  • Flat panel displays
  • Functional coatings
  • Optical information storage
  • Glass coatings for automotive and architectural glass
  • Optical communications

Ytterbium Sputtering Target Packaging

TFM’s ytterbium sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Due to the high chemical activity of this material when exposed to the environment, we offer oil packaging and clean procedures to prevent chemical reactions and maintain the integrity of the targets.

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TFM offers Ytterbium Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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