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yttria-fully-stabilized-zirconia

VD0746 Yttria Stabilized Zirconia (YSZ) Evaporation Materials

Catalog No.VD0746
MaterialYttria Fully Stabilized Zirconia
Purity99.9%
ShapePowder/ Granule/ Custom-made

TFM stands out as a top-tier manufacturer and supplier specializing in high-purity Yttria Stabilized Zirconia (YSZ) evaporation materials. We provide a diverse range of evaporation materials, available in both powder and granule forms. For those with specific needs, we also offer customized options tailored to meet your unique requirements.

MSDS File
Yttria Stabilized Zirconia (YSZ) Evaporation Materials Overview

Yttria Stabilized Zirconia (YSZ) is a highly regarded ceramic electrolyte material known for its exceptional performance and reliability. At TFM, we provide YSZ evaporation materials with a purity level reaching up to 99.9995%, ensuring superior quality for various deposition processes. Our commitment to stringent quality assurance practices guarantees the dependability of our products.

Yttria Stabilized Zirconia (YSZ) Evaporation Materials Specifications

Crystal structurecubic（a=5.125Å ）
Density5.8g/cm3
purity99.99%
Thermal expansivity10.3ppm/℃
Dielectric constant27
Orientation<100>、<110>、<111>±0.5o, or special orientation
Sizedia 2” ×0.5mm, 25×25×0.5mm, 15×15×0.5mm,10×10×0.5mm, 10×5×0.5mm, 5×5×0.5mm, and customized
PolishedOne side or double side polished
Surface roughness≤5Å

Applications of Yttria Stabilized Zirconia (YSZ) Evaporation Materials

YSZ evaporation materials are versatile and crucial in several high-tech applications:

  • Film Coatings: Ideal for anti-reflection films, hard coatings, glasses films, and multilayer films.
  • Deposition Processes: Used in semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optics: Suitable for wear protection, decorative coatings, and display technologies.

Packaging and Handling

To ensure optimal preservation and prevent damage, our YSZ evaporation pellets are meticulously packaged in plastic vacuum bags. Each package includes a Certificate of Analysis (COA) for the raw material, ensuring transparency and quality control.

Contact Us

TFM excels in producing top-tier Yttria Stabilized Zirconia evaporation materials for a range of applications, including semiconductor, CVD, PVD, and optical industries. Our integration of engineering, manufacturing, and analytical expertise enables us to deliver leading-edge materials that meet industry standards.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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