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VD0741 Yttrium(III) Oxide Evaporation Materials, Y2O3

Catalog No.VD0741
MaterialYttrium Oxide (Yb2O3)
Purity99.9% ~ 99.99%
ShapePowder/ Granule/ Custom-made

TFM is a trusted manufacturer and supplier of high-purity yttrium(III) oxide evaporation materials, along with a wide range of other evaporation materials. These materials are available in powder and granule form to suit various applications. For specific needs, customized forms are also available upon request, ensuring flexibility and precision in meeting project requirements.

Introduction

Yttrium(III) Oxide Evaporation Materials (Y₂O₃) are high-purity rare earth oxide sources widely used in optical coatings, dielectric films, protective layers, and advanced ceramic thin film research. Y₂O₃ is valued for its high refractive index, excellent thermal stability, and strong chemical resistance, making it suitable for demanding vacuum deposition environments.

In physical vapor deposition (PVD) processes such as thermal evaporation and electron beam evaporation, material purity and stoichiometric control are critical to achieving consistent optical and electrical performance. Carefully processed Y₂O₃ evaporation materials ensure stable vaporization behavior, minimal contamination, and reliable film properties across research and industrial applications.

Detailed Description

Yttrium(III) Oxide (Y₂O₃) is a white crystalline oxide with a melting point of approximately 2410°C and excellent structural stability. Its wide bandgap and strong dielectric properties make it suitable for high-performance electronic and optical thin films.

Key features include:

  • High Purity Grades (3N–5N typical) – Reduces trace metallic and alkali impurities that may affect dielectric strength and optical clarity.

  • Stoichiometric Y₂O₃ Composition – Ensures predictable film refractive index and electrical characteristics.

  • High Melting Point & Thermal Stability – Suitable for high-temperature deposition and post-deposition annealing.

  • Optimized Particle Morphology – Available in powder, granule, or pellet form to support uniform melting and controlled evaporation.

Due to its high melting temperature, electron beam evaporation is commonly preferred for Y₂O₃ deposition. Gradual power ramping is recommended to minimize spitting and ensure stable evaporation rates. In reactive or oxygen-rich environments, Y₂O₃ maintains chemical stability, making it suitable for multilayer oxide stacks.

Y₂O₃ films are often used as dielectric layers, optical high-index layers, or protective coatings in plasma and corrosive environments.

Applications

Yttrium(III) Oxide Evaporation Materials are widely used in:

  • Optical Coatings
    High-index layers in multilayer interference filters and laser optics.

  • High-k Dielectric Films
    Gate dielectric research and advanced oxide electronics.

  • Protective & Barrier Coatings
    Plasma-resistant coatings in semiconductor processing equipment.

  • Phosphor & Luminescent Film Research
    Host matrix for rare earth-doped thin films.

  • Advanced Ceramic Thin Films
    Functional oxide layers in microelectronic and MEMS devices.

Technical Parameters

ParameterTypical Value / RangeImportance
Purity99.9% – 99.999% (3N–5N)Minimizes defect density in films
Chemical FormulaY₂O₃Ensures consistent stoichiometry
Melting Point~2410°CSuitable for high-temperature processes
Refractive Index~1.8–1.9 (visible range)Important for optical stack design
FormPowder / Granules / PelletsCompatible with evaporation systems
PackagingVacuum-sealed / moisture-protectedPreserves material integrity

Comparison with Related Oxide Materials

MaterialKey AdvantageTypical Application
Yttrium Oxide (Y₂O₃)High thermal stability & dielectric strengthOptical & electronic films
Aluminum Oxide (Al₂O₃)Excellent hardness & insulationProtective coatings
Hafnium Oxide (HfO₂)Very high dielectric constantAdvanced gate dielectrics
Cerium Oxide (CeO₂)Redox activityCatalytic & functional films

Compared to Al₂O₃, Y₂O₃ provides higher refractive index and improved plasma resistance. Compared to HfO₂, it offers strong dielectric properties with excellent chemical stability.

FAQ

QuestionAnswer
Is Y₂O₃ suitable for thermal evaporation?Due to its high melting point, electron beam evaporation is generally preferred.
Can purity levels be customized?Yes, multiple purity grades are available depending on application requirements.
Does Y₂O₃ require special storage?It is relatively stable but should be stored in dry, sealed packaging to prevent contamination.
What forms are available?Powder, granules, and pellets can be supplied according to system compatibility.
Which industries use Y₂O₃ films most?Semiconductor manufacturing, optics production, plasma-resistant coatings, and research institutions.

Packaging

Our Yttrium(III) Oxide Evaporation Materials are meticulously tagged and labeled externally to ensure efficient identification and maintain high standards of quality control. We take great care to prevent any potential damage during storage and transportation, ensuring the materials arrive in perfect condition.

Conclusion

Yttrium(III) Oxide Evaporation Materials (Y₂O₃) provide a high-purity, thermally stable solution for depositing durable dielectric and optical thin films. With controlled stoichiometry, flexible supply forms, and compatibility with advanced evaporation techniques, Y₂O₃ supports demanding semiconductor, optical, and materials research applications.

For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.

Order Now

Y2O3 Pieces 3N 2–6mm 500g

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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