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Yttrium(III) Oxide Evaporation Materials

VD0741 Yttrium(III) Oxide Evaporation Materials, Y2O3

Catalog No.VD0741
MaterialYttrium Oxide (Yb2O3)
Purity99.9% ~ 99.99%
ShapePowder/ Granule/ Custom-made

TFM is a trusted manufacturer and supplier of high-purity yttrium(III) oxide evaporation materials, along with a wide range of other evaporation materials. These materials are available in powder and granule form to suit various applications. For specific needs, customized forms are also available upon request, ensuring flexibility and precision in meeting project requirements.

MSDS File

Yttrium(III) Oxide Evaporation Materials Overview

TFM provides high-purity yttrium(III) oxide (Y2O3) evaporation materials, an essential component in various deposition processes. Yttrium oxide, known for its white color, has a melting point of 2,425°C, a density of 5.01 g/cm³, and a vapor pressure of 10^-4 Torr at approximately 2,000°C. It is a critical yttrium compound used in applications such as phosphors for red color in televisions and yttrium iron garnets for microwave filters. TFM specializes in producing yttrium oxide with up to 99.9995% purity, ensuring the highest quality and reliability through stringent quality control processes.

Related Products:

Yttrium Evaporation Materials, Oxide Ceramic Evaporation Materials

Yttrium(III) Oxide Evaporation Materials Specification

Material TypeYttrium(III) Oxide
SymbolY2O3
Appearance/ColorWhite solid
Melting Point2,425 °C (4,397 °F; 2,698 K)
Density5.010 g/cm3, solid
Purity99.9% ~ 99.99%
ShapePowder/ Granule/ Custom-made

Applications of Yttrium(III) Oxide Evaporation Materials

Yttrium(III) oxide evaporation materials are employed in a variety of advanced applications, including:

  • Deposition Processes: Suitable for semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optical Coatings: Used in wear protection, decorative coatings, and display technologies.

Packaging and Quality Assurance

TFM ensures that yttrium(III) oxide evaporation materials are packaged with clear labeling for efficient identification and quality control. Special care is taken to prevent any damage during storage and transportation.

Contact and Customization

TFM is a leading provider of high-purity yttrium(III) oxide evaporation materials, available in various forms such as tablets, granules, rods, and wires. Customized shapes and quantities can be tailored to specific needs upon request. Additionally, TFM offers evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For pricing inquiries or information on materials not listed, please contact TFM for further details.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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