Introduction
Molybdenum Oxide Sputtering Target (MoO₃) is a key oxide material used in advanced thin-film deposition processes, particularly where precise control of electronic structure, optical transparency, and work function is required. As a wide-bandgap transition metal oxide, MoO₃ plays a critical role in modern optoelectronic, semiconductor, and energy-related devices. Its ability to form uniform, stable oxide films makes it a preferred choice for research laboratories and industrial coating systems alike.
Detailed Description
MoO₃ sputtering targets are manufactured from high-purity molybdenum trioxide powder that is carefully processed through controlled pressing and sintering steps. This ensures high density, low porosity, and excellent compositional uniformity—factors that directly influence sputtering stability and thin-film consistency.
Compared with metallic molybdenum targets, MoO₃ targets enable direct deposition of oxide films without the complexity of reactive sputtering. This simplifies process control, reduces oxygen flow fluctuations, and improves repeatability in both RF and DC sputtering systems (typically RF is preferred due to the insulating nature of MoO₃).
From an application standpoint, MoO₃ is valued for its high work function, strong electron-accepting behavior, and excellent optical transparency in the visible range. These characteristics make MoO₃ films especially suitable for interface layers, charge transport layers, and functional oxide coatings where electronic alignment and film purity are critical.
Custom geometries—including round, rectangular, and bonded targets—are available to match different sputtering cathodes and power densities.
Applications
Molybdenum Oxide sputtering targets are widely used in the following fields:
Organic electronics: Hole injection and hole transport layers in OLEDs and organic photovoltaics (OPVs)
Semiconductor devices: Interface and buffer layers in thin-film transistors (TFTs) and sensors
Electrochromic devices: Smart windows and optical modulation coatings
Energy technologies: Functional layers in lithium-ion batteries and supercapacitors
Optical coatings: Transparent oxide films with tailored refractive properties
Research & development: Thin-film studies involving transition metal oxides and surface engineering
Technical Parameters
| Parameter | Typical Value / Range | Importance |
|---|---|---|
| Chemical Composition | MoO₃ (Molybdenum Trioxide) | Determines electronic and optical properties |
| Purity | 99.9% – 99.99% | Reduces contamination and improves film performance |
| Diameter | 25 – 300 mm (custom) | Compatible with various sputtering systems |
| Thickness | 3 – 6 mm (typical) | Affects target lifetime and sputtering rate |
| Density | ≥ 95% of theoretical | Ensures stable sputtering and uniform erosion |
| Bonding | Indium / Elastomer / Direct | Enhances thermal contact and mechanical stability |
Comparison with Related Materials
| Material | Key Advantage | Typical Application |
|---|---|---|
| MoO₃ | High work function, excellent transparency | OLEDs, OPVs, interface layers |
| WO₃ | Strong electrochromic response | Smart windows, displays |
| V₂O₅ | High ionic conductivity | Batteries, sensors |
| Metallic Mo | High conductivity | Barrier layers, electrodes |
FAQ
| Question | Answer |
|---|---|
| Can MoO₃ sputtering targets be customized? | Yes, purity, size, thickness, and bonding options can be tailored. |
| Is RF sputtering required for MoO₃? | MoO₃ is an insulating oxide, so RF sputtering is generally recommended. |
| How is the target packaged? | Vacuum-sealed with protective cushioning to prevent moisture uptake and damage. |
| Can MoO₃ replace reactive sputtering processes? | In many cases, yes—using an oxide target simplifies process control and improves repeatability. |
Packaging
Our Molybdenum Oxide Sputtering Targets (MoO₃) are meticulously tagged and labeled externally to ensure efficient identification and strict quality control. Each target is carefully vacuum-sealed and protected with reinforced cushioning to prevent contamination, moisture exposure, or mechanical damage during storage and transportation, ensuring arrival in optimal condition.
Conclusion
Molybdenum Oxide Sputtering Target (MoO₃) offers a reliable, process-stable solution for depositing high-quality oxide thin films with well-defined electronic and optical properties. With flexible customization options and consistent manufacturing quality, it is well-suited for both cutting-edge research and scalable industrial production.
For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.
Related Product: Molybdenum Sputtering Target
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