Thin Film Materials Logo
Generic selectors
Exact matches only
Search in title
Search in content
Post Type Selectors
Praseodymium Cerium Manganate Sputtering Target

ST0464 Praseodymium Cerium Manganate Sputtering Target

Chemical Formula: Pr(1-x)CexMnO3
Catalog Number: ST0464
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Praseodymium Cerium Manganate sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

MSDS File

Praseodymium Cerium Manganate Sputtering Target Description

Praseodymium Cerium Manganate Sputtering Target is made from praseodymium, cerium, manganese, and oxygen. These high-purity targets are essential in deposition processes to achieve high-quality films. TFM specializes in producing sputtering targets with up to 99.9995% purity, ensuring reliable and consistent product performance through rigorous quality assurance processes.

Related products: Praseodymium Sputtering Target, Cerium Sputtering Target, Manganese Sputtering Target

Praseodymium

CeriummanganeseOxygen

Praseodymium Cerium Manganate Sputtering Target Specification

Material Type Praseodymium Cerium Manganate
Symbol Pr(1-x)CexMnO3
Color/Appearance Solid
Melting Point /
Density /
Type of Bond Elastomer, Indium
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets; please Contact Us for more information.

Praseodymium Cerium Manganate Sputtering Target Application

Praseodymium Cerium Manganate Sputtering Target is utilized for thin film deposition, decoration, semiconductor applications, displays, LEDs, and photovoltaic devices. Additionally, it is used for functional coatings and various optical information storage industries, including glass coatings for automotive and architectural applications, as well as in optical communication.

Praseodymium Cerium Manganate Sputtering Target Bonding Services

Specialized bonding services for Praseodymium Cerium Manganate Sputtering Targets, including indium and elastomeric bonding techniques, enhance performance and durability. Thin Film Materials (TFM) ensures high-quality solutions that meet industry standards and customer needs.

We also offer custom machining of backing plates, which is essential for sputtering target assembly. This comprehensive approach improves target design flexibility and performance in thin film deposition. Our channels provide detailed information about bonding materials, methods, and services, helping clients make informed decisions.

Praseodymium Cerium Manganate Sputtering Target Packaging

Our Praseodymium Cerium Manganate Sputter Targets are meticulously handled to prevent any damage during storage and transportation, ensuring the preservation of the products’ original quality.

Get Contact

TFM offers Praseodymium Cerium Manganate Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

Reviews

There are no reviews yet.

Be the first to review “ST0464 Praseodymium Cerium Manganate Sputtering Target”

Your email address will not be published. Required fields are marked *

Related Products

Related products

FAQ

It’s the source material (in solid form) used in sputter deposition to eject atoms or molecules that then form a thin film on a substrate.

Targets can be pure metals (e.g., gold, copper, aluminum), ceramics (e.g., Al₂O₃, SiO₂, TiO₂), alloys, or composites—chosen based on the film’s desired properties.

 

They are produced by processes such as melting/casting for metals or sintering (often with hot isostatic pressing) for ceramics and composite targets to ensure high density and purity.

 

In a vacuum chamber, a plasma (typically argon) bombards the target, ejecting atoms that travel and condense on a substrate, forming a thin film.

 

Key factors include the target’s purity, density, grain structure, and the sputtering yield (i.e. how many atoms are ejected per incident ion), as well as operating conditions like power density and gas pressure.

 

Operators monitor target erosion (often by measuring the depth of the eroded “race track”) or track total energy delivered (kilowatt-hours) until it reaches a threshold that can compromise film quality.

 

Fragile materials (such as many ceramics or certain oxides) and precious metals often require a backing plate to improve cooling, mechanical stability, and to allow thinner targets that reduce material costs.

 

DC sputtering is used for conductive targets, while RF sputtering is necessary for insulating targets (like many oxides) because it prevents charge buildup on the target’s surface.

 

In reactive sputtering, a reactive gas (e.g., oxygen or nitrogen) is introduced to form compound films on the substrate, but it may also “poison” the target surface if not carefully controlled.

 

Many manufacturers prefer to control raw material quality by sourcing their own powders; using external powders can risk impurities and inconsistent target properties.

 

Targets should be stored in clean, dry conditions (often in original packaging or re-wrapped in protective materials) and handled with gloves to avoid contamination, ensuring optimal performance during deposition.

Deposition rate depends on factors such as target material and composition, power density, working gas pressure, substrate distance, and the configuration of the sputtering system (e.g., magnetron design).

 
Shopping Cart
Scroll to Top