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VD0720 Praseodymium Calcium Manganate Evaporation Materials, Pr0.7Ca0.3MnO3

Catalog No.VD0720
MaterialPraseodymium Calcium Manganate
Purity99.9%
ShapePowder/ Granule/ Custom-made

TFM stands out as a premier manufacturer and supplier of high-purity praseodymium calcium manganate evaporation materials. Alongside this, we provide a wide array of other evaporation materials to meet your diverse requirements. Our offerings are available in both powder and granule forms, with the added flexibility of customized shapes to align perfectly with your specific application needs.

MSDS File

Praseodymium Calcium Manganate Evaporation Materials Overview

TFM offers high-purity praseodymium calcium manganate evaporation materials, an essential oxide material with the chemical composition Pr0.7Ca0.3MnO3. These materials are crucial in deposition processes, ensuring the production of superior-quality films. TFM is dedicated to manufacturing evaporation materials with purity levels as high as 99.9995%, utilizing rigorous quality assurance processes to ensure the reliability and consistency of our products.

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Applications of Praseodymium Calcium Manganate Evaporation Materials

TFM’s praseodymium calcium manganate evaporation materials are versatile and used in various applications, including:

  • Deposition Processes: Ideal for use in semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optics: Employed in creating wear-resistant coatings, decorative finishes, and displays.

Packaging and Handling

To ensure easy identification and maintain the integrity of the praseodymium calcium manganate evaporation materials, each package is meticulously labeled and tagged. We take great care in packaging to prevent any damage during storage or transportation, safeguarding the material’s quality.

Contact TFM

As a leading manufacturer and supplier of high-purity praseodymium calcium manganate evaporation materials, TFM offers a variety of forms including tablets, granules, rods, and wires. We also provide custom shapes and quantities to meet your specific requirements. In addition to evaporation materials, we supply evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For pricing details or inquiries about materials not listed, please reach out to us.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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