ST0267 Tantalum Silicide Sputtering Target, TaSi2

Tantalum Silicide Sputtering Target Description

Tantalum silicide sputtering target is a specialized ceramic material made up of tantalum and silicon, used primarily for thin film deposition in various high-tech applications. This material is known for its high melting point, hardness, and good electrical conductivity, making it suitable for use in the semiconductor industry, particularly in the manufacturing of integrated circuits and microelectronics.

Tantalum is a chemical element named after King Tantalus, a figure from Greek mythology. It was first identified in 1802 by Swedish chemist Anders Gustaf Ekeberg. The element is represented by the symbol “Ta” on the periodic table and has an atomic number of 73. Tantalum is located in Period 6 and Group 5, belonging to the d-block of elements. It has a relative atomic mass of 180.94788(2) Daltons, with the number in brackets indicating the uncertainty in its measurement.

Related Product: Tantalum Sputtering Target

Silicon is a chemical element with its name derived from the Latin words ‘silex’ or ‘silicis,’ meaning flint. It was first described in 1824 by the Swedish chemist Jöns Jakob Berzelius, who also successfully isolated the element. Silicon is represented by the symbol “Si” on the periodic table and has an atomic number of 14. It is situated in Period 3 and Group 14, within the p-block of elements. The relative atomic mass of silicon is 28.0855(3) Daltons, with the number in brackets indicating the uncertainty in its value.

Tantalum Silicide Sputtering Target Application

The tantalum silicide sputtering target is utilized in a variety of applications including thin film deposition, decoration, semiconductors, displays, LEDs, and photovoltaic devices. It is also employed in functional coatings and optical information storage industries, as well as in glass coating industries, such as for car glass and architectural glass. Additionally, it plays a role in optical communication technologies.

Tantalum Silicide Sputtering Target Packing

Our tantalum silicide sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. We take great care in handling and packaging these targets to prevent any damage during storage or transportation, ensuring they arrive in pristine condition.

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TFM offers Tantalum Silicide Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.