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Titanium Monoxide Evaporation Materials

VD0737 Titanium Monoxide Evaporation Materials, TiO

Material Type：Titanium (II) Oxide
Symbol：TiO
Color/Appearance：Dark, Crystalline Solid
Purity：99.9%
Shape：Powder/ Granule/ Custom-made

TFM is a trusted provider of high-purity titanium monoxide evaporation materials, along with a diverse selection of evaporation materials for various applications. We offer these materials in both powder and granule forms to meet different needs. Additionally, we can accommodate custom requests to provide tailored solutions for your specific requirements.

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Titanium Monoxide Evaporation Materials Overview

TFM offers high-quality titanium monoxide (TiO) evaporation materials, which are essential in various deposition processes. With a chemical formula of TiO, these high-purity materials play a critical role in ensuring optimal film deposition. TFM specializes in producing titanium monoxide evaporation materials with up to 99.9995% purity, adhering to rigorous quality control measures to ensure the reliability of the final product.

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Titanium Evaporation Materials

Titanium Monoxide Evaporation Materials Specifications

Material TypeTitanium Monoxide
SymbolTiO
Appearance/ColorDark, Crystalline Solid
Melting Point1,750 °C (3,180 °F; 2,020 K)
Density4.95 g/cm3
Purity99.9%
ShapePowder/ Granule/ Custom-made

Applications of Titanium Monoxide Evaporation Materials

Titanium monoxide evaporation materials are utilized in a variety of cutting-edge applications, including:

  • Deposition Processes: Commonly used in semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optics & Coatings: Applied in wear protection, decorative coatings, and display technologies.

Packaging and Quality Control

TFM ensures that all titanium monoxide evaporation materials are carefully packaged and clearly labeled for easy identification and quality control. Stringent measures are taken during storage and transportation to prevent damage, preserving the integrity of the product until it reaches the customer.

Contact and Customization

TFM is a leading provider of high-purity titanium monoxide evaporation materials in various forms, including tablets, granules, rods, and wires. Custom shapes and quantities are available upon request. In addition to evaporation materials, TFM supplies evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For pricing inquiries or further information on other materials, feel free to reach out to TFM for a quote.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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