Pure Element Evaporation Material

Overview of Pure Element Evaporation Material

Pure Element Evaporation Material are essential in various industries, including electronics, optics, and thin-film deposition technologies. These high-purity materials are used to create thin, uniform metal films on substrates through the process of evaporation, a method where metal is heated to its vapor point and deposited as a thin layer onto a surface.

The materials, which include metals like Aluminum, Copper, Gold, Silver, and Titanium, are known for their superior quality, high melting points, and excellent conductivity. They are typically available in various forms such as pellets, powders, and pieces, and their purity can range from 99.99% to 99.9999%, ensuring the best possible performance in high-precision applications.

At Thin Film Materials (TFM), we provide an extensive range of Pure Element Evaporation Material to meet the needs of industries that require high-performance thin films. Our materials are carefully selected to offer consistent quality and reliability, ensuring optimal results in every application.

For more information or to inquire about our products, please contact us via email at sales@thinfilmmaterials.com or call us at (786) 825-8645.

Technical Documents & SDS Downloads

Thin-Film Materials provides general Safety Data Sheets (SDS) for major ceramic sputtering target categories to support material handling, EHS compliance, and procurement documentation requirements.
These SDS files are intended as general reference documents for common ceramic material families and may not represent every specific composition, dopant level, impurity profile, or custom-engineered target.
For product-specific SDS documentation, please refer to the individual product page or contact our sales team directly.

Pure Element Evaporation Materials SDS (PDF)

Applicable to common pure element evaporation materials including:
Al, Ag, Au, Cr, Cu, Fe, Hf, In, Ir, Mg, Mo, Nb, Ni, Pd, Pt, Re, Si, Sn, Ta, Ti, W, Zn, Zr, and related high-purity elemental evaporation materials.

High-Purity Metal Evaporation Materials

Product Name	Chemical Formula	Melting Point (°C)	Density (g/cm³)	Purity	Action
Aluminum	Al	660.3	2.7	99.99-99.9999%
Antimony	Sb	630.63	6.697	99.999-99.99999%
Barium	Ba	727	3.62	99.50%
Bismuth	Bi	271	9.78	99.9, 99.999%
Boron	B	2076	2.34	99.99%
Calcium	Ca	842	1.54	99.50%
Cadmium	Cd	321	8.65	99.99%
Cerium	Ce	798	6.77	99.90%
Chromium	Cr	1907	7.19	99.95%
Cobalt	Co	1495	8.9	99.90%
Copper	Cu	1084	8.96	99.99, 99.999%
Dysprosium	Dy	1412	8.55	99.90%
Europium	Eu	1527	5.24	99.90%
Erbium	Er	1529	9.06	99.90%
Gallium	Ga	29.8	5.91	99.99%~99.99999%
Gadolinium	Gd	1313	7.9	99.90%
Germanium	Ge	938	5.32	100.00%
Gold	Au	1064	19.32	99.99, 99.999%
Hafnium	Hf	2233	13.31	99.95%
Indium	In	156.6	7.31	99.99-99.9999%
Iridium	Ir	2446	22.56	99.90%
Iron	Fe	1538	7.87	99.9-99.95%
Lead	Pb	327.5	11.34	100.00%
Lanthanum	La	920	6.15	99.90%
Lithium	Li	180.54	0.534	99.90%
Lutetium	Lu	1663	9.84	99.90%
Magnesium	Mg	650	1.738	99.99%
Manganese	Mn	1244	7.43	99.90%
Molybdenum	Mo	2623	10.22	99.95%
Neodymium	Nd	1021	7	99.90%
Nickel	Ni	1455	8.9	99.7, 99.995%
Niobium	Nb	2477	8.57	99.95%
Palladium	Pd	1554	12.02	99.95%
Platinum	Pt	1773	21.45	99.99%
Praseodymium	Pr	931	6.77	99.90%
Rhodium	Rh	1964	12.41	99.95%
Ruthenium	Ru	2334	12.37	99.90%
Samarium	Sm	1072	7.52	99.90%
Scandium	Sc	1541	2.99	99.90%
Selenium	Se	221	4.81	99.999-99.9999%
Silicon	Si	1414	2.33	100.00%
Silver	Ag	961.8	10.49	99.99%
Strontium	Sr	1382	2.64	99.50%
Sulfur	S	115	2.07	99.999%
Tantalum	Ta	3017	16.69	99.95%
Terbium	Tb	1356	8.23	99.90%
Thulium	Tm	1818	9.32	99.90%
Tin	Sn	231.9	7.31	99.99%
Titanium	Ti	1668	4.54	99.7-99.995%
Tungsten	W	3422	19.25	99.95%
Vanadium	V	1910	6.11	99.90%
Ytterbium	Yb	824	6.57	99.90%
Yttrium	Y	1526	4.47	99.90%
Zinc	Zn	419	7.14	99.99, 99.995%
Zirconium	Zr	1855	6.52	99.95%